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Role of aluminum ion implantation on microstructure, microhardness and corrosion properties of titanium alloy

  • Y. Z. Liu*
  • , X. T. Zu
  • , L. Wang
  • , S. Y. Qiu
  • *此作品的通讯作者
  • National Key Laboratory for Nuclear Fuel and Materials
  • University of Electronic Science and Technology of China

科研成果: 期刊稿件文章同行评审

摘要

Ti-Al-Zr alloy was implanted with Al at cumulative doses between 1 × 1017 and 1 × 1018 ions/cm2. The results indicate that the Al-implanted layers are ∼0.1 μm thick and are composed almost entirely of an amorphous layer. Implanted layer hardness is dose dependent and is increased by more than a factor of 4 for the high-dose implanted specimen when compared with that of the substrate material. The corrosion resistance of the sample was markedly improved after aluminum implantation.

源语言英语
页(从-至)444-447
页数4
期刊Vacuum
83
2
DOI
出版状态已出版 - 26 9月 2008
已对外发布

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