Review of defect detection technologies for single-crystal silicon optical components

Monocrystalline silicon optical components are widely used in optical systems, laser technology, and semiconductor devices owing to their excellent physical and optical properties. However, during processing and use, they are prone to surface and subsurface defects, which can degrade optical performance, mechanical strength, and service life. Surface defects such as scratches and pockmarks cause scattering and diffraction, lowering imaging quality and laser damage thresholds, whereas subsurface defects may alter refractive index, thermal stability, and mechanical strength, further reducing reliability. Therefore, effective detection of both surface and subsurface defects is crucial. This paper reviews detection technologies for monocrystalline silicon optical components. By comparing the advantages and limitations of different techniques, this review highlights future research directions and potential improvements. The review aims to provide technical support for high-precision manufacturing, performance enhancement, and reliable application of monocrystalline silicon optical components.