Research on fabrication technology of electrode in MEMS device

Qing Tao Zhang; Yan Qiu Li

Research on fabrication technology of electrode in MEMS device

Qing Tao Zhang^*
, Yan Qiu Li

^*此作品的通讯作者

CAS - Institute of Electrical Engineering

科研成果: 期刊稿件 › 文章 › 同行评审

摘要

The availability of the domestic positive resist BP212 and optical exposure equipment in fabricating the electrode of MEMS device using lift-off process is discussed. The results show that the available photoresist section with undercut profile and metal line with μm-level line uniformity are obtained by the adopted method, which simplifies lift-off process, reduces the cost and improves the metal electrode fabrication.

源语言	英语
页（从-至）	53-56
页数	4
期刊	Weixi Jiagong Jishu/Microfabrication Technology
期	3
出版状态	已出版 - 9月 2005
已对外发布	是

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@article{5c01eb7fdaf24a2c91910fe9568c5d07,

title = "Research on fabrication technology of electrode in MEMS device",

abstract = "The availability of the domestic positive resist BP212 and optical exposure equipment in fabricating the electrode of MEMS device using lift-off process is discussed. The results show that the available photoresist section with undercut profile and metal line with μm-level line uniformity are obtained by the adopted method, which simplifies lift-off process, reduces the cost and improves the metal electrode fabrication.",

keywords = "Electrode, Lift-off, Photoresist",

author = "Zhang, \{Qing Tao\} and Li, \{Yan Qiu\}",

year = "2005",

month = sep,

language = "English",

pages = "53--56",

journal = "Weixi Jiagong Jishu/Microfabrication Technology",

issn = "1003-8213",

publisher = "Weixi Jiagong Jishu",

number = "3",

}

TY - JOUR

T1 - Research on fabrication technology of electrode in MEMS device

AU - Zhang, Qing Tao

AU - Li, Yan Qiu

PY - 2005/9

Y1 - 2005/9

N2 - The availability of the domestic positive resist BP212 and optical exposure equipment in fabricating the electrode of MEMS device using lift-off process is discussed. The results show that the available photoresist section with undercut profile and metal line with μm-level line uniformity are obtained by the adopted method, which simplifies lift-off process, reduces the cost and improves the metal electrode fabrication.

AB - The availability of the domestic positive resist BP212 and optical exposure equipment in fabricating the electrode of MEMS device using lift-off process is discussed. The results show that the available photoresist section with undercut profile and metal line with μm-level line uniformity are obtained by the adopted method, which simplifies lift-off process, reduces the cost and improves the metal electrode fabrication.

KW - Electrode

KW - Lift-off

KW - Photoresist

UR - https://www.scopus.com/pages/publications/27744435011

M3 - Article

AN - SCOPUS:27744435011

SN - 1003-8213

SP - 53

EP - 56

JO - Weixi Jiagong Jishu/Microfabrication Technology

JF - Weixi Jiagong Jishu/Microfabrication Technology

IS - 3

ER -

Research on fabrication technology of electrode in MEMS device

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