摘要
CNx films with high nitrogen content were prepared by the use of liquid phase electrodeposition from a dicyandiamide precursor. The deposited CNx films contain a high nitrogen content at about 48 at%. Single, double bonds, and a certain amount of triple bonds coexist in the films. Post-deposition thermal treatments promoted the formation of C-N bonds and induced film structural changes.
| 源语言 | 英语 |
|---|---|
| 页(从-至) | 1485-1488 |
| 页数 | 4 |
| 期刊 | Journal of Materials Science Letters |
| 卷 | 18 |
| 期 | 18 |
| DOI | |
| 出版状态 | 已出版 - 1 1月 1999 |
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