Microstructural and optoelectronic properties of rf magnetron sputtered ZnO:(Ga,Ti) semiconductor thin films

Engineering

• Thin Films 100%
• Optoelectronics 100%
• Magnetron 100%
• Radio Frequency 100%
• Microstructure 66%
• Conductive 33%
• Ray Diffraction 33%
• Dielectrics 33%
• Refractive Index 33%
• Glass Substrate 33%
• Deposited Film 33%
• Energy Gap 33%
• Oxide Film 33%
• Figure of Merit 33%
• Extinction Coefficient 33%
• Polycrystalline 33%
• Optical Spectrum 33%
• Dissipation Factor 33%
• Probe Point 33%

Physics

• Optoelectronics 100%
• Thin Films 100%
• Magnetron 100%
• X Ray Diffraction 33%
• Refractivity 33%
• Transmittance 33%
• Permittivity 33%
• Polycrystalline 33%
• Magnetron Sputtering 33%
• Spectrophotometer 33%
• Grain Size 33%
• Wurtzite 33%
• Spectra 33%
• Oxide Film 33%

Material Science

• Film 100%
• Thin Films 100%
• ZnO 100%
• X-Ray Diffraction 16%
• Grain Size 16%
• Refractive Index 16%
• Magnetron Sputtering 16%
• Electrical Resistivity 16%
• Oxide Film 16%
• Permittivity 16%