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Kinetics study of aluminium deposition on inner wall of pipes by atomic layer deposition

  • Heng Liu
  • , Yuqing Xiong*
  • , Jizhou Wang
  • *此作品的通讯作者
  • Chinese Academy of Sciences

科研成果: 期刊稿件会议文章同行评审

摘要

In this paper, feasibility of aluminium deposition on inner wall of pipes by atomic layer deposition was studied. Firstly, by solving kinetics equation of gas adsorption on the pipe inner wall, the time for the reactant to reach saturated adsorption on the wall was calculated. Secondly, according to the aluminium crystal structure, the thickness of each deposition cycle was obtained. Finally, the minimum aluminium thickness and number of atomic layer deposition cycles that can meet electromagnetic requirement of wave guide was calculated.

源语言英语
页(从-至)627-632
页数6
期刊Advanced Materials Research
482-484
DOI
出版状态已出版 - 2012
已对外发布
活动3rd international Conference on Manufacturing Science and Engineering, ICMSE 2012 - Xiamen, 中国
期限: 27 3月 201229 3月 2012

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