TY - JOUR
T1 - Investigation of the dual-parameter material removal framework for coordinated multi-TIFs planning in magnetorheological jet polishing
AU - Miao, Yulu
AU - Feng, Yunpeng
AU - Cheng, Haobo
AU - Lin, Kangju
AU - Zhang, Yang
AU - Wu, Jiang
AU - Gao, Kun
N1 - Publisher Copyright:
© Higher Education Press 2026.
PY - 2026/6
Y1 - 2026/6
N2 - Magnetorheological jet polishing is a non-contact, deterministic technique for ultra-precision fabrication of hard and brittle optical materials. To address efficiency and scalability, this work develops a dual-parameter material removal model through dimensional analysis, coupling jet pressure and dwell time for flexible tool influence function (TIF) adaptation. A parameter planning algorithm is then established to allocate dwell times among multiple TIFs, enabling fabrication of microlens arrays (MLAs) with varying feature-to-spot ratios. Experiments reveal controllable subunit geometry, stable optical parameters, and edge effects evolving from amplification in small arrays to attenuation or reversal in larger ones, in agreement with model predictions. The proposed model and algorithm provide stable topography control and optical optimization across multiple array scales, demonstrating effectiveness for large-scale MLA fabrication and potential applicability to planar, spherical, and aspherical optical surfaces. (Figure presented.)
AB - Magnetorheological jet polishing is a non-contact, deterministic technique for ultra-precision fabrication of hard and brittle optical materials. To address efficiency and scalability, this work develops a dual-parameter material removal model through dimensional analysis, coupling jet pressure and dwell time for flexible tool influence function (TIF) adaptation. A parameter planning algorithm is then established to allocate dwell times among multiple TIFs, enabling fabrication of microlens arrays (MLAs) with varying feature-to-spot ratios. Experiments reveal controllable subunit geometry, stable optical parameters, and edge effects evolving from amplification in small arrays to attenuation or reversal in larger ones, in agreement with model predictions. The proposed model and algorithm provide stable topography control and optical optimization across multiple array scales, demonstrating effectiveness for large-scale MLA fabrication and potential applicability to planar, spherical, and aspherical optical surfaces. (Figure presented.)
KW - magnetorheological jet polishing
KW - material removal modelling
KW - micro cutting
KW - parameter planning algorithm
KW - ultra-precision fabrication
UR - https://www.scopus.com/pages/publications/105043949768
U2 - 10.1007/s11465-026-0889-z
DO - 10.1007/s11465-026-0889-z
M3 - Article
AN - SCOPUS:105043949768
SN - 3091-4965
VL - 21
JO - ENGINEERING Mechanical Engineering
JF - ENGINEERING Mechanical Engineering
IS - 3
M1 - 100889
ER -