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In situ X-ray reflectivity study of imprint in ferroelectric thin films

  • Jiang Li Cao*
  • , Kai Zhang
  • , Axel Solbach
  • , Zhenxing Yue
  • , Huang Hua Wang
  • , Yu Chen
  • , Uwe Klemradt
  • *此作品的通讯作者
  • University of Science and Technology Beijing
  • RWTH Aachen University
  • Tsinghua University
  • CAS - Institute of High Energy Physics

科研成果: 书/报告/会议事项章节会议稿件同行评审

摘要

The structural origin of imprint in Pb(Zr,Ti)O3 (PZT) ferroelectric thin films derived by chemical solution deposition with Pt top and bottom electrodes was studied by in-situ high-resolution X-ray specular reflectivity of synchrotron radiation. Global structural parameters of density, thickness, and surface or interface roughness of each component layer in the thin film sample were obtained. No generation of interfacial layers with a different electron density from PZT and no interface roughening were observed at the interfaces of PZT and Pt during imprint. Thus, the results suggest that the imprint effect is more likely a bulk or electronic defects-related phenomenon.

源语言英语
主期刊名Functional and Electronic Materials
出版商Trans Tech Publications Ltd.
292-296
页数5
ISBN(印刷版)9783037851692
DOI
出版状态已出版 - 2011
已对外发布

出版系列

姓名Materials Science Forum
687
ISSN(印刷版)0255-5476
ISSN(电子版)1662-9752

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