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Hafnium intercalation between epitaxial graphene and Ir(111) substrate

  • Linfei Li*
  • , Yeliang Wang
  • , Lei Meng
  • , Rong Ting Wu
  • , H. J. Gao
  • *此作品的通讯作者
  • CAS - Institute of Physics

科研成果: 期刊稿件文章同行评审

摘要

We report on the change of structural and electronic properties while depositing Hf atoms onto the graphene epitaxially grown on Ir(111) substrate. We find that the Hf atoms intercalate between the graphene and its iridium host. This intercalation induces a new interface superstructure, as confirmed by scanning tunneling microscopy and low energy electron diffraction. Raman spectra reveal that the Hf-intercalated graphene shows the prominent features of intrinsic graphene. Our study suggests that the Hf intercalation acts as a buffer layer between the graphene and the Ir(111) substrate, restoring the graphenes intrinsic electronic properties.

源语言英语
文章编号093106
期刊Applied Physics Letters
102
9
DOI
出版状态已出版 - 4 3月 2013
已对外发布

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