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Graphitic carbon nitride thin films deposited by electrodeposition

  • Chao Li
  • , Chuan Bao Cao*
  • , He Sun Zhu
  • *此作品的通讯作者
  • Beijing Institute of Technology
  • Zhengzhou Institute of Technology

科研成果: 期刊稿件文章同行评审

摘要

Electrodeposition method was used to deposit the graphitic carbon nitride thin film on Si (100) substrate from a saturated acetonitrile solution of 2,4,6-trichloro-1,3,5-triazine and 2,4,6-triamino-1,3,5-trazine at room temperature. X-ray powder diffraction (XRD) results show that the d-values are in good agreement with the data of graphite-like carbon nitride calculated in the literature. X-ray photoelectron spectra (XPS) measurements indicate the elements in the deposited films were mostly of C and N (N/C=0.88), and N bonded with C in the forms of C-N and C=N bond. The Fourier transform infrared (FTIR) spectroscopy indicates that CN aromatic ring exists in the product. These results demonstrate that crystalline g-C3N4 was obtained.

源语言英语
页(从-至)1903-1906
页数4
期刊Materials Letters
58
12-13
DOI
出版状态已出版 - 5月 2004

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