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Graphene-Silicon Layered Structures on Single-Crystalline Ir(111) Thin Films

  • Yande Que
  • , Yong Zhang
  • , Yeliang Wang
  • , Li Huang
  • , Wenyan Xu
  • , Jing Tao
  • , Lijun Wu
  • , Yimei Zhu
  • , Kisslinger Kim
  • , Michael Weinl
  • , Matthias Schreck
  • , Chengmin Shen
  • , Shixuan Du
  • , Yunqi Liu
  • , H. J. Gao*
  • *此作品的通讯作者

科研成果: 期刊稿件文章同行评审

摘要

Single-crystalline transition metal films are ideal playing fields for the epitaxial growth of graphene and graphene-based materials. Graphene-silicon layered structures are successfully constructed on Ir(111) thin films on Si substrates with an yttria-stabilized zirconia buffer layer via intercalation approach. Such heterolayered structures are compatible with the current Si-based microelectronic technique, showing high promise for applications in future micro- and nanoelectronic devices.

源语言英语
文章编号1400543
期刊Advanced Materials Interfaces
2
3
DOI
出版状态已出版 - 1 2月 2015
已对外发布

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