摘要
Single-crystalline transition metal films are ideal playing fields for the epitaxial growth of graphene and graphene-based materials. Graphene-silicon layered structures are successfully constructed on Ir(111) thin films on Si substrates with an yttria-stabilized zirconia buffer layer via intercalation approach. Such heterolayered structures are compatible with the current Si-based microelectronic technique, showing high promise for applications in future micro- and nanoelectronic devices.
| 源语言 | 英语 |
|---|---|
| 文章编号 | 1400543 |
| 期刊 | Advanced Materials Interfaces |
| 卷 | 2 |
| 期 | 3 |
| DOI | |
| 出版状态 | 已出版 - 1 2月 2015 |
| 已对外发布 | 是 |
指纹
探究 'Graphene-Silicon Layered Structures on Single-Crystalline Ir(111) Thin Films' 的科研主题。它们共同构成独一无二的指纹。引用此
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