Gate-independent energy gap in noncovalently intercalated bilayer graphene on SiC(0001)

Our first-principles calculations show that an energy gap around 0.12-0.25 eV can be engineered in epitaxial graphene on SiC(0001) through the noncovalent intercalation of transition or alkali metals but originated from the distinct mechanisms. The former is attributed to the combined effects of a metal-induced perpendicular electric field and interaction, while the latter is solely attributed to the built-in electric field. A great advantage of this scheme is that the gap size is almost independent of the gate voltage up to 1 V/nm, thus reserving the electric means to tune the Fermi level of graphene when configured as field-effect transistors. Given the recent progress in experimental techniques for intercalated graphene, our findings provide a practical way to incorporate graphene in the current semiconductor industry.