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Design and fabrication of planar GaAs Schottky barrier diodes for submillimeter-wave applications

  • Jinchao Mou*
  • , Yong Yuan
  • , Xin Lv
  • , Weihua Yu
  • , Dawei He
  • , Jinghui Wang
  • , Guohua Xiao
  • *此作品的通讯作者
  • Beijing Institute of Technology
  • 13th Research Institute

科研成果: 书/报告/会议事项章节会议稿件同行评审

摘要

The design consideration and fabrication of a planar GaAs Schottky barrier diode with cutoff frequency up to 650 GHz is presented in this paper. The theory and design principle was given at the beginning. Then, the key material and geometrical parameters are analyzed using electron behavior analysis and the finite element method. Considering the analyzed results as well as fabrication cost and complexity, a group of trade-off parameters was determined. Finally the Schottky diode was fabricated and measured.

源语言英语
主期刊名2010 International Conference on Microwave and Millimeter Wave Technology, ICMMT 2010
1746-1749
页数4
DOI
出版状态已出版 - 2010
活动2010 International Conference on Microwave and Millimeter Wave Technology, ICMMT 2010 - Chengdu, 中国
期限: 8 5月 201011 5月 2010

出版系列

姓名2010 International Conference on Microwave and Millimeter Wave Technology, ICMMT 2010

会议

会议2010 International Conference on Microwave and Millimeter Wave Technology, ICMMT 2010
国家/地区中国
Chengdu
时期8/05/1011/05/10

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