摘要
The deposition of Cu at room temperature on a V2O3(0001) surface, which was prepared on a Re(0001) substrate at first, is studied by XPS (X-ray photoelectron spectroscopy), UPS (ultraviolet photoelectron spectroscopy), and LEED (low-energy-electron diffraction). The XPS results indicate that the growth of Cu follows the patch-wise Stranski-Krastanov mode. Auger parameter and UPS show that at low coverages the deposited Cu has the Cu(I) state due to the interaction of Cu with V2O3 substrate; Cu becomes metallic at Cu coverage > 2 MLE (monolayer equivalent). The epitaxial Cu films on the V2O3(0001) have Cu(111)R30° superstructures observed by LEED.
| 源语言 | 英语 |
|---|---|
| 页(从-至) | 4721-4724 |
| 页数 | 4 |
| 期刊 | Journal of Physical Chemistry B |
| 卷 | 106 |
| 期 | 18 |
| DOI | |
| 出版状态 | 已出版 - 9 5月 2002 |
| 已对外发布 | 是 |
指纹
探究 'Cu on V2O3(0001) films: Growth and interaction' 的科研主题。它们共同构成独一无二的指纹。引用此
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