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Cu on V2O3(0001) films: Growth and interaction

  • Wende Xiao
  • , Kan Xie
  • , Qinlin Guo*
  • , E. G. Wang
  • *此作品的通讯作者
  • CAS - Institute of Physics

科研成果: 期刊稿件文章同行评审

摘要

The deposition of Cu at room temperature on a V2O3(0001) surface, which was prepared on a Re(0001) substrate at first, is studied by XPS (X-ray photoelectron spectroscopy), UPS (ultraviolet photoelectron spectroscopy), and LEED (low-energy-electron diffraction). The XPS results indicate that the growth of Cu follows the patch-wise Stranski-Krastanov mode. Auger parameter and UPS show that at low coverages the deposited Cu has the Cu(I) state due to the interaction of Cu with V2O3 substrate; Cu becomes metallic at Cu coverage > 2 MLE (monolayer equivalent). The epitaxial Cu films on the V2O3(0001) have Cu(111)R30° superstructures observed by LEED.

源语言英语
页(从-至)4721-4724
页数4
期刊Journal of Physical Chemistry B
106
18
DOI
出版状态已出版 - 9 5月 2002
已对外发布

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