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Critical Role of GIDL Current for Erase Operation in 3D Vertical FeFET and Compact Long-term FeFET Retention Model

  • Fei Mo
  • , Jiawen Xiang
  • , Xiaoran Mei*
  • , Yoshiki Sawabe
  • , Takuya Saraya
  • , Toshiro Hiramoto
  • , Chun Jung Su
  • , Vita Pi Ho Hu
  • , Masaharu Kobayashi
  • *此作品的通讯作者
  • The University of Tokyo
  • Taiwan Semiconductor Research Institute
  • National Taiwan University

科研成果: 书/报告/会议事项章节会议稿件同行评审

摘要

We have investigated and revealed the critical role of GIDL current for efficient erase operation in 3D vertical FeFET by developing proper test structures and demonstrated a compact long-term FeFET retention model based on nucleation-limited switching, for the first time. We also proposed novel FeFET process for low voltage operation by controlling oxygen intrusion into the gate stack. This work contributes to the realization of high-density and low-power 3D vertical FeFET.

源语言英语
主期刊名2021 Symposium on VLSI Technology, VLSI Technology 2021
出版商Institute of Electrical and Electronics Engineers Inc.
ISBN(电子版)9784863487802
出版状态已出版 - 2021
已对外发布
活动41st Symposium on VLSI Technology, VLSI Technology 2021 - Virtual, Online, 日本
期限: 13 6月 202119 6月 2021

出版系列

姓名Digest of Technical Papers - Symposium on VLSI Technology
2021-June
ISSN(印刷版)0743-1562

会议

会议41st Symposium on VLSI Technology, VLSI Technology 2021
国家/地区日本
Virtual, Online
时期13/06/2119/06/21

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