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Band gap independent intrinsic nonlinear optical response for rational materials design

  • Xuanlin Pan
  • , Bonan Zhu*
  • , Aoge Yao
  • , Zheshuai Lin
  • , Lei Kang*
  • *此作品的通讯作者
  • CAS - Technical Institute of Physics and Chemistry
  • University of Chinese Academy of Sciences
  • Beijing Institute of Technology
  • University College London

科研成果: 期刊稿件文献综述同行评审

摘要

Nonlinear optical (NLO) phenomena play a pivotal role in materials research and technological advancements, particularly for optoelectronic modulation and advanced photonic devices. Accurate evaluation of intrinsic NLO responses is crucial for targeted material discovery and performance optimization. However, conventional NLO coefficients (Formula presented.) exhibit strong bandgap (Eg) dependence, fundamentally distorting their correlation with actual conversion efficiency (η). This limitation not only impedes fair performance comparisons across materials with different Eg values but also artificially amplifies the NLO capabilities of narrow-Eg systems. To address this critical challenge, we propose an intrinsic NLO metric (pi¡k = δijk · χιι(1), incorporating a static Miller dispersion correction (διjk) that enables cross-Eg evaluations and reveals structural limits of achievable η through fundamental parameter optimization. Our first-principles calculations, performed using our in-house NLOtools, demonstrate the advantage of (φijk over (Formula presented.) in decoupling Eg effects while establishing a robust framework for rational design. This framework is demonstrated through the rational design of KCuMoS4, where targeted skeletal reconstruction and elemental substitution yielded a superior intrinsic NLO potential, confirmed by its concurrently high φijk and normalized Φijk values. The favorable performance of KCuMoS4 illustrates a route to mitigating the classic trade-offbetween (Formula presented.) and Eg, providing a practical methodology for the rational design of high-performance NLO materials.

源语言英语
文章编号195123
期刊Physical Review B
112
19
DOI
出版状态已出版 - 4月 2026
已对外发布

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