跳到主要导航 跳到搜索 跳到主要内容

An optimization method to measure chromatic aberration with Shack-Hartmann wavefront sensor

  • Dexuan Fu
  • , Xinqi Hu*
  • , Chuanxu Wu
  • *此作品的通讯作者
  • Beijing Institute of Technology
  • Ministry of Industry and Information Technology

科研成果: 书/报告/会议事项章节会议稿件同行评审

摘要

The Shack-Hartmann wavefront sensor (SHWFS) is widely used in adaptive optics, laser beam shaping, optical testing, and other fields. Traditional Shack-Hartmann wavefront sensors are primarily used to measure monochromatic wavefront aberrations. In the measurement of human eye aberrations, the Shack-Hartmann wavefront sensor has been employed to measure longitudinal chromatic aberrations and transverse chromatic aberrations of the human eye, but most methods are based on filter-based measurements, i.e., separately measuring the monochromatic wavefront aberrations of different wavelengths. This paper proposes a chromatic aberrations measurement method based on the spot array image of the multi-wavelength Shack-Hartmann wavefront sensor. The method uses the spot images, and based on phase retrieval principles, applies an improved particle swarm optimization algorithm and BFGS algorithm jointly to reduce the error function, thereby determining the wavefront aberrations of multiple wavelengths of light, and the difference of which is the chromatic aberrations. This way, the method achieves comprehensive measurement of wavefront aberrations and chromatic aberrations.

源语言英语
主期刊名Optical Design and Testing XV
编辑Yongtian Wang, Tina E. Kidger, Rengmao Wu
出版商SPIE
ISBN(电子版)9781510693845
DOI
出版状态已出版 - 20 11月 2025
已对外发布
活动15th Optical Design and Testing - Beijing, 中国
期限: 12 10月 202514 10月 2025

丛书

姓名Proceedings of SPIE - The International Society for Optical Engineering
13716
ISSN(印刷版)0277-786X
ISSN(电子版)1996-756X

会议

会议15th Optical Design and Testing
国家/地区中国
Beijing
时期12/10/2514/10/25

学术指纹

探究 'An optimization method to measure chromatic aberration with Shack-Hartmann wavefront sensor' 的科研主题。它们共同构成独一无二的学术指纹。

引用此