@inproceedings{61931427af1243c095c703202a497f8e,
title = "Advanced Computational Lithography based on Information Theory",
abstract = "As the integration circuit manufacturing enters the advanced technology nodes, computational lithography encounters a big challenge in breaking through the limitation of lithography image fidelity. This work introduces an information theoretical method to explore the limit of image fidelity for advanced computational lithography. An information channel model is built up to depict the information transfer between the mask and print image, and the extension to include the characteristics of extreme ultraviolet lithography imaging model is discussed. Then, the methods to calculate of optimal information transfer for advanced computational lithography is briefly introduced, and the theoretical limit of image fidelity is derived. The proposed method could also be applied to improve the solutions of traditional computational lithography techniques.",
keywords = "Computational Lithography, Extreme Ultraviolet Lithography, Image Fidelity Limit, Information Entropy, Information Theory",
author = "Bingyang Wang and Xu Ma",
note = "Publisher Copyright: {\textcopyright} 2024 SPIE.; 8th International Workshop on Advanced Patterning Solutions, IWAPS 2024 ; Conference date: 15-10-2024 Through 16-10-2024",
year = "2024",
doi = "10.1117/12.3053031",
language = "English",
series = "Proceedings of SPIE - The International Society for Optical Engineering",
publisher = "SPIE",
editor = "Yayi Wei and Tianchun Ye",
booktitle = "Eighth International Workshop on Advanced Patterning Solutions, IWAPS 2024",
address = "United States",
}