A single-crystal silicon-based micromirror with large scanning angle for biomedical applications

Huikai Xie; Ankur Jain; Tuqiang Xie; Yingtian Pan; Gary K. Fedder

A single-crystal silicon-based micromirror with large scanning angle for biomedical applications

Huikai Xie^*
, Ankur Jain
, Tuqiang Xie
, Yingtian Pan
, Gary K. Fedder

^*此作品的通讯作者

University of Florida
Stony Brook University
Carnegie Mellon University

科研成果: 期刊稿件 › 会议文章 › 同行评审

5 引用（Scopus）

摘要

This paper reports a single-crystalline silicon (SCS)-based micromirror with large scanning angle (up to 31°) which can be used for biomédical imaging. The micromirror is fabricated by using a deep reactive-ion-etch (DRIE) post-CMOS micromachining process. Thin bimorph actuation structures and movable bulk silicon structures are simultaneously achieved. The micromirror is 1 mm by 1 mm in size, coated with aluminum, and thermally actuated by an integrated polysilicon heater. The radius of curvature of the mirror surface is about 50 cm. The mirror rotates 31° at 9 mA. The resonant frequency of the device is 380 Hz.

源语言	英语
页（从-至）	861-863
页数	3
期刊	OSA Trends in Optics and Photonics Series
卷	88
出版状态	已出版 - 2003
已对外发布	是
活动	Conference on Lasers and Electro-Optics (CLEO); Postconference Digest - Baltimore, MD, 美国期限: 1 6月 2003 → 6 6月 2003

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@article{c6ab26540f444af8afdc0bfe26b4676d,

title = "A single-crystal silicon-based micromirror with large scanning angle for biomedical applications",

abstract = "This paper reports a single-crystalline silicon (SCS)-based micromirror with large scanning angle (up to 31°) which can be used for biom{\'e}dical imaging. The micromirror is fabricated by using a deep reactive-ion-etch (DRIE) post-CMOS micromachining process. Thin bimorph actuation structures and movable bulk silicon structures are simultaneously achieved. The micromirror is 1 mm by 1 mm in size, coated with aluminum, and thermally actuated by an integrated polysilicon heater. The radius of curvature of the mirror surface is about 50 cm. The mirror rotates 31° at 9 mA. The resonant frequency of the device is 380 Hz.",

author = "Huikai Xie and Ankur Jain and Tuqiang Xie and Yingtian Pan and Fedder, \{Gary K.\}",

year = "2003",

language = "English",

volume = "88",

pages = "861--863",

journal = "OSA Trends in Optics and Photonics Series",

issn = "1094-5695",

note = "Conference on Lasers and Electro-Optics (CLEO); Postconference Digest ; Conference date: 01-06-2003 Through 06-06-2003",

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TY - JOUR

T1 - A single-crystal silicon-based micromirror with large scanning angle for biomedical applications

AU - Xie, Huikai

AU - Jain, Ankur

AU - Xie, Tuqiang

AU - Pan, Yingtian

AU - Fedder, Gary K.

PY - 2003

Y1 - 2003

N2 - This paper reports a single-crystalline silicon (SCS)-based micromirror with large scanning angle (up to 31°) which can be used for biomédical imaging. The micromirror is fabricated by using a deep reactive-ion-etch (DRIE) post-CMOS micromachining process. Thin bimorph actuation structures and movable bulk silicon structures are simultaneously achieved. The micromirror is 1 mm by 1 mm in size, coated with aluminum, and thermally actuated by an integrated polysilicon heater. The radius of curvature of the mirror surface is about 50 cm. The mirror rotates 31° at 9 mA. The resonant frequency of the device is 380 Hz.

AB - This paper reports a single-crystalline silicon (SCS)-based micromirror with large scanning angle (up to 31°) which can be used for biomédical imaging. The micromirror is fabricated by using a deep reactive-ion-etch (DRIE) post-CMOS micromachining process. Thin bimorph actuation structures and movable bulk silicon structures are simultaneously achieved. The micromirror is 1 mm by 1 mm in size, coated with aluminum, and thermally actuated by an integrated polysilicon heater. The radius of curvature of the mirror surface is about 50 cm. The mirror rotates 31° at 9 mA. The resonant frequency of the device is 380 Hz.

UR - https://www.scopus.com/pages/publications/8744307663

M3 - Conference article

AN - SCOPUS:8744307663

SN - 1094-5695

VL - 88

SP - 861

EP - 863

JO - OSA Trends in Optics and Photonics Series

JF - OSA Trends in Optics and Photonics Series

T2 - Conference on Lasers and Electro-Optics (CLEO); Postconference Digest

Y2 - 1 June 2003 through 6 June 2003

ER -

A single-crystal silicon-based micromirror with large scanning angle for biomedical applications

摘要

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