摘要
Classical metal wire grid polarizers are commonly employed as infrared polarizers due to their broad operating spectrum. However, their low extinction ratio limits applications in high-precision infrared polarization in short-wavelength infrared range. Analysis using the Rigorous Coupled Wave Analysis indicates that the extinction ratio of a metal wire grid polarizer is positively correlated with the depth of the metal grating layer. Traditional etching and lift-off methods are insufficient for achieving the necessary depth to realize a high extinction ratio. In this paper, we propose an approach to fabricate infrared wire grid polarizers with ultra-high extinction ratios by combining Laser Interference Lithography with Oblique Angled Deposition method. The wire grid polarizer has a periodic structure of 300 nm and a grating layer depth of 450 nm, with an aspect ratio of 3:1. Experimental results demonstrate that the average transmission for TM wave exceeds 70 %, while the average extinction ratio surpasses 40 dB (10000:1) within the 1 μm to 2.5 μm range. The wire grid polarizer fabricated using the simple and low-cost methods has the potential to become a commercially viable product.
| 源语言 | 英语 |
|---|---|
| 文章编号 | 113099 |
| 期刊 | Optics and Laser Technology |
| 卷 | 189 |
| DOI | |
| 出版状态 | 已出版 - 11月 2025 |
| 已对外发布 | 是 |
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