@inproceedings{6f4f823a2e474f3ab721b3d500487745,
title = "Zernike polynomial based pupil wavefront optimization technology for extreme ultraviolet lithography",
abstract = "The NA 0.33 EUV lithography tool is applied at 3nm logic node where the aberrations and 3D mask effects are difficult to eliminate. It limits resolution further reduced. In this paper, a Zernike polynomial based pupil wavefront optimization (ZBPWO) technology for NA0.33 EUV is proposed. An active wavefront is applied to the imaging model which consist of 64 Zernike polynomials using an inverse optimization algorithm. The optimal pupil wavefront can improve image quality effectively. Simulation results show that the ZBPWO method reduce the pattern error about 50\%. It demonstrate the impact of aberrations and 3D mask effects are controlled very well.",
keywords = "Computational Lithography, EUV, Pupil wavefront optimization, Zernike polynomials",
author = "Miao Yuan and Zhaoxuan Li and He Yang and Zhen Li and Yuqing Chen and Yanqiu Li",
note = "Publisher Copyright: {\textcopyright} 2024 SPIE.; 8th International Workshop on Advanced Patterning Solutions, IWAPS 2024 ; Conference date: 15-10-2024 Through 16-10-2024",
year = "2024",
doi = "10.1117/12.3055164",
language = "English",
series = "Proceedings of SPIE - The International Society for Optical Engineering",
publisher = "SPIE",
editor = "Yayi Wei and Tianchun Ye",
booktitle = "Eighth International Workshop on Advanced Patterning Solutions, IWAPS 2024",
address = "United States",
}