Wavelength-dependent third-harmonic generation in monolayer MoS2

Yadong Wang; Susobhan Das; Xuerong Hu; Yunyun Dai; Xueyin Bai; Zhipei Sun

doi:10.1364/CLEO_AT.2020.JTh2E.32

Wavelength-dependent third-harmonic generation in monolayer MoS₂

Yadong Wang^*
, Susobhan Das
, Xuerong Hu
, Yunyun Dai
, Xueyin Bai
, Zhipei Sun

^*Corresponding author for this work

Aalto University

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

Abstract

We present broadband third harmonic generation (THG) in monolayer MoS₂, showing strong enhancement (up to three orders of magnitude) with excitons. Our results pave the way to understand strong THG in MoS2 for potential applications.

Original language	English
Title of host publication	CLEO
Subtitle of host publication	Applications and Technology, CLEO_AT 2020
Publisher	Optica Publishing Group (formerly OSA)
ISBN (Print)	9781943580767
DOIs	https://doi.org/10.1364/CLEO_AT.2020.JTh2E.32
Publication status	Published - 2020
Externally published	Yes
Event	CLEO: Applications and Technology, CLEO_AT 2020 - Washington, United States Duration: 10 May 2020 → 15 May 2020

Publication series

Name	Optics InfoBase Conference Papers
Volume	Part F181-CLEO-AT 2020
ISSN (Electronic)	2162-2701

Conference

Conference	CLEO: Applications and Technology, CLEO_AT 2020
Country/Territory	United States
City	Washington
Period	10/05/20 → 15/05/20

Access to Document

10.1364/CLEO_AT.2020.JTh2E.32

Cite this

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title = "Wavelength-dependent third-harmonic generation in monolayer MoS2",

abstract = "We present broadband third harmonic generation (THG) in monolayer MoS2, showing strong enhancement (up to three orders of magnitude) with excitons. Our results pave the way to understand strong THG in MoS2 for potential applications.",

author = "Yadong Wang and Susobhan Das and Xuerong Hu and Yunyun Dai and Xueyin Bai and Zhipei Sun",

note = "Publisher Copyright: {\textcopyright} 2020 The Author(s).; CLEO: Applications and Technology, CLEO\_AT 2020 ; Conference date: 10-05-2020 Through 15-05-2020",

year = "2020",

doi = "10.1364/CLEO\_AT.2020.JTh2E.32",

language = "English",

isbn = "9781943580767",

series = "Optics InfoBase Conference Papers",

publisher = "Optica Publishing Group (formerly OSA)",

booktitle = "CLEO",

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}

Wang, Y, Das, S, Hu, X, Dai, Y, Bai, X & Sun, Z 2020, Wavelength-dependent third-harmonic generation in monolayer MoS₂. in CLEO: Applications and Technology, CLEO_AT 2020., JTh2E.32, Optics InfoBase Conference Papers, vol. Part F181-CLEO-AT 2020, Optica Publishing Group (formerly OSA), CLEO: Applications and Technology, CLEO_AT 2020, Washington, United States, 10/05/20. https://doi.org/10.1364/CLEO_AT.2020.JTh2E.32

Wavelength-dependent third-harmonic generation in monolayer MoS₂. / Wang, Yadong; Das, Susobhan; Hu, Xuerong et al.
CLEO: Applications and Technology, CLEO_AT 2020. Optica Publishing Group (formerly OSA), 2020. JTh2E.32 (Optics InfoBase Conference Papers; Vol. Part F181-CLEO-AT 2020).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

TY - GEN

T1 - Wavelength-dependent third-harmonic generation in monolayer MoS2

AU - Wang, Yadong

AU - Das, Susobhan

AU - Hu, Xuerong

AU - Dai, Yunyun

AU - Bai, Xueyin

AU - Sun, Zhipei

PY - 2020

Y1 - 2020

N2 - We present broadband third harmonic generation (THG) in monolayer MoS2, showing strong enhancement (up to three orders of magnitude) with excitons. Our results pave the way to understand strong THG in MoS2 for potential applications.

AB - We present broadband third harmonic generation (THG) in monolayer MoS2, showing strong enhancement (up to three orders of magnitude) with excitons. Our results pave the way to understand strong THG in MoS2 for potential applications.

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U2 - 10.1364/CLEO_AT.2020.JTh2E.32

DO - 10.1364/CLEO_AT.2020.JTh2E.32

M3 - Conference contribution

AN - SCOPUS:85095134375

SN - 9781943580767

T3 - Optics InfoBase Conference Papers

BT - CLEO

PB - Optica Publishing Group (formerly OSA)

T2 - CLEO: Applications and Technology, CLEO_AT 2020

Y2 - 10 May 2020 through 15 May 2020

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