TY - GEN
T1 - Three-dimensional polarization aberration in hyper-numerical aperture lithography optics
AU - Wang, Jingmin
AU - Li, Yanqiu
PY - 2012
Y1 - 2012
N2 - Polarization aberration is usually represented by Jones pupil with two-dimensional (2D) format in local coordinate system. People transform the 2D polarization aberration into global coordinate system for three-dimensional (3D) imaging simulation by using mathematical coordinate transformation, rather than 3D polarization aberration defined by physics, which results in a lack of precision of 3D imaging simulation. In this paper, a new representation of 3D polarization aberration is introduced. Then the 3D polarization aberration of a hyper-NA lithography optics is extracted that is available to precisely describe the polarization properties of the optics and evaluate the 3D vector imaging performance without additional mathematical coordinate transformation. 3D polarization aberration of this paper avoids the errors of transforming 2D polarization aberration into global coordinate system mathematically.
AB - Polarization aberration is usually represented by Jones pupil with two-dimensional (2D) format in local coordinate system. People transform the 2D polarization aberration into global coordinate system for three-dimensional (3D) imaging simulation by using mathematical coordinate transformation, rather than 3D polarization aberration defined by physics, which results in a lack of precision of 3D imaging simulation. In this paper, a new representation of 3D polarization aberration is introduced. Then the 3D polarization aberration of a hyper-NA lithography optics is extracted that is available to precisely describe the polarization properties of the optics and evaluate the 3D vector imaging performance without additional mathematical coordinate transformation. 3D polarization aberration of this paper avoids the errors of transforming 2D polarization aberration into global coordinate system mathematically.
KW - Hyper-NA lithography
KW - Polarization ray tracing matrix
KW - Three-dimensional polarization aberration
UR - https://www.scopus.com/pages/publications/84861501687
U2 - 10.1117/12.916299
DO - 10.1117/12.916299
M3 - Conference contribution
AN - SCOPUS:84861501687
SN - 9780819489821
T3 - Proceedings of SPIE - The International Society for Optical Engineering
BT - Optical Microlithography XXV
T2 - Optical Microlithography XXV
Y2 - 13 February 2012 through 16 February 2012
ER -