Three-dimensional polarization aberration in hyper-numerical aperture lithography optics

  • Jingmin Wang
  • , Yanqiu Li*
  • *Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

Polarization aberration is usually represented by Jones pupil with two-dimensional (2D) format in local coordinate system. People transform the 2D polarization aberration into global coordinate system for three-dimensional (3D) imaging simulation by using mathematical coordinate transformation, rather than 3D polarization aberration defined by physics, which results in a lack of precision of 3D imaging simulation. In this paper, a new representation of 3D polarization aberration is introduced. Then the 3D polarization aberration of a hyper-NA lithography optics is extracted that is available to precisely describe the polarization properties of the optics and evaluate the 3D vector imaging performance without additional mathematical coordinate transformation. 3D polarization aberration of this paper avoids the errors of transforming 2D polarization aberration into global coordinate system mathematically.

Original languageEnglish
Title of host publicationOptical Microlithography XXV
DOIs
Publication statusPublished - 2012
EventOptical Microlithography XXV - San Jose, CA, United States
Duration: 13 Feb 201216 Feb 2012

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume8326
ISSN (Print)0277-786X

Conference

ConferenceOptical Microlithography XXV
Country/TerritoryUnited States
CitySan Jose, CA
Period13/02/1216/02/12

Keywords

  • Hyper-NA lithography
  • Polarization ray tracing matrix
  • Three-dimensional polarization aberration

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