Thickness dependent valence fluctuation of CeN film

Wende Xiao; Qinlin Guo; E. G. Wang

doi:10.1016/j.susc.2004.09.004

Thickness dependent valence fluctuation of CeN film

Wende Xiao
, Qinlin Guo^*
, E. G. Wang

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

5 Citations (Scopus)

Abstract

CeN films with different thickness are synthesized on a Re(0001) substrate and studied by X-ray photoelectron spectroscopy (XPS) and Auger electron spectroscopy. A thickness dependent valence fluctuation is observed by XPS. Valence fluctuation only occurs with film thickness larger than a critical value of about 15nm. This interesting phenomenon is mainly attributed to the stress in CeN films due to the large lattice mismatch between the CeN film and the substrate, and a possible composition deviation at the interface.

Original language	English
Pages (from-to)	296-300
Number of pages	5
Journal	Surface Science
Volume	572
Issue number	2-3
DOIs	https://doi.org/10.1016/j.susc.2004.09.004
Publication status	Published - 20 Nov 2004
Externally published	Yes

Keywords

Auger electron spectroscopy
Cerium
Nitrides
X-ray photoelectron spectroscopy

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10.1016/j.susc.2004.09.004

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title = "Thickness dependent valence fluctuation of CeN film",

abstract = "CeN films with different thickness are synthesized on a Re(0001) substrate and studied by X-ray photoelectron spectroscopy (XPS) and Auger electron spectroscopy. A thickness dependent valence fluctuation is observed by XPS. Valence fluctuation only occurs with film thickness larger than a critical value of about 15nm. This interesting phenomenon is mainly attributed to the stress in CeN films due to the large lattice mismatch between the CeN film and the substrate, and a possible composition deviation at the interface.",

keywords = "Auger electron spectroscopy, Cerium, Nitrides, X-ray photoelectron spectroscopy",

author = "Wende Xiao and Qinlin Guo and Wang, \{E. G.\}",

year = "2004",

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doi = "10.1016/j.susc.2004.09.004",

language = "English",

volume = "572",

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journal = "Surface Science",

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TY - JOUR

T1 - Thickness dependent valence fluctuation of CeN film

AU - Xiao, Wende

AU - Guo, Qinlin

AU - Wang, E. G.

PY - 2004/11/20

Y1 - 2004/11/20

N2 - CeN films with different thickness are synthesized on a Re(0001) substrate and studied by X-ray photoelectron spectroscopy (XPS) and Auger electron spectroscopy. A thickness dependent valence fluctuation is observed by XPS. Valence fluctuation only occurs with film thickness larger than a critical value of about 15nm. This interesting phenomenon is mainly attributed to the stress in CeN films due to the large lattice mismatch between the CeN film and the substrate, and a possible composition deviation at the interface.

AB - CeN films with different thickness are synthesized on a Re(0001) substrate and studied by X-ray photoelectron spectroscopy (XPS) and Auger electron spectroscopy. A thickness dependent valence fluctuation is observed by XPS. Valence fluctuation only occurs with film thickness larger than a critical value of about 15nm. This interesting phenomenon is mainly attributed to the stress in CeN films due to the large lattice mismatch between the CeN film and the substrate, and a possible composition deviation at the interface.

KW - Auger electron spectroscopy

KW - Cerium

KW - Nitrides

KW - X-ray photoelectron spectroscopy

UR - https://www.scopus.com/pages/publications/9644283206

U2 - 10.1016/j.susc.2004.09.004

DO - 10.1016/j.susc.2004.09.004

M3 - Article

AN - SCOPUS:9644283206

SN - 0039-6028

VL - 572

SP - 296

EP - 300

JO - Surface Science

JF - Surface Science

IS - 2-3

ER -

Thickness dependent valence fluctuation of CeN film

Abstract

Keywords

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