Theoretical analysis of nanoscale local etching of a rough quartz surface under direct illumination

Vasyl Kanevskii; Hongyu Fu; Serhii Kolienov; Valerii Grygoruk; Hao Zhang; Oleksandr Stelmakh

doi:10.1364/OE.518668

Theoretical analysis of nanoscale local etching of a rough quartz surface under direct illumination

Vasyl Kanevskii
, Hongyu Fu
, Serhii Kolienov
, Valerii Grygoruk
, Hao Zhang^*
, Oleksandr Stelmakh

^*Corresponding author for this work

School of Mechanical Engineering

Research output: Contribution to journal › Article › peer-review

1 Citation (Scopus)

Abstract

A 3D model of photochemical polishing of rough quartz surfaces under direct illumination has been developed. One of the features of the model is its ability to predict the results of a photochemical polishing process without the need for time-consuming calculations. The proposed model analyzes the characteristics of the surface evolution during polishing based on the initial roughness parameters and the polarization of the incident radiation. When a rough surface is irradiated with linearly polarized light, a textured surface in the form of furrows is produced. Non-polarized radiation is recommended to obtain a flatter surface.

Original language	English
Pages (from-to)	24728-24743
Number of pages	16
Journal	Optics Express
Volume	32
Issue number	14
DOIs	https://doi.org/10.1364/OE.518668
Publication status	Published - 1 Jul 2024

Access to Document

10.1364/OE.518668

Cite this

@article{3113848088064fac9419980080d7eb57,

title = "Theoretical analysis of nanoscale local etching of a rough quartz surface under direct illumination",

abstract = "A 3D model of photochemical polishing of rough quartz surfaces under direct illumination has been developed. One of the features of the model is its ability to predict the results of a photochemical polishing process without the need for time-consuming calculations. The proposed model analyzes the characteristics of the surface evolution during polishing based on the initial roughness parameters and the polarization of the incident radiation. When a rough surface is irradiated with linearly polarized light, a textured surface in the form of furrows is produced. Non-polarized radiation is recommended to obtain a flatter surface.",

author = "Vasyl Kanevskii and Hongyu Fu and Serhii Kolienov and Valerii Grygoruk and Hao Zhang and Oleksandr Stelmakh",

note = "Publisher Copyright: {\textcopyright} 2024 Optica Publishing Group under the terms of the Optica Open Access Publishing Agreement.",

year = "2024",

month = jul,

day = "1",

doi = "10.1364/OE.518668",

language = "English",

volume = "32",

pages = "24728--24743",

journal = "Optics Express",

issn = "1094-4087",

publisher = "Optica Publishing Group",

number = "14",

}

TY - JOUR

T1 - Theoretical analysis of nanoscale local etching of a rough quartz surface under direct illumination

AU - Kanevskii, Vasyl

AU - Fu, Hongyu

AU - Kolienov, Serhii

AU - Grygoruk, Valerii

AU - Zhang, Hao

AU - Stelmakh, Oleksandr

PY - 2024/7/1

Y1 - 2024/7/1

N2 - A 3D model of photochemical polishing of rough quartz surfaces under direct illumination has been developed. One of the features of the model is its ability to predict the results of a photochemical polishing process without the need for time-consuming calculations. The proposed model analyzes the characteristics of the surface evolution during polishing based on the initial roughness parameters and the polarization of the incident radiation. When a rough surface is irradiated with linearly polarized light, a textured surface in the form of furrows is produced. Non-polarized radiation is recommended to obtain a flatter surface.

AB - A 3D model of photochemical polishing of rough quartz surfaces under direct illumination has been developed. One of the features of the model is its ability to predict the results of a photochemical polishing process without the need for time-consuming calculations. The proposed model analyzes the characteristics of the surface evolution during polishing based on the initial roughness parameters and the polarization of the incident radiation. When a rough surface is irradiated with linearly polarized light, a textured surface in the form of furrows is produced. Non-polarized radiation is recommended to obtain a flatter surface.

UR - https://www.scopus.com/pages/publications/85198250359

U2 - 10.1364/OE.518668

DO - 10.1364/OE.518668

M3 - Article

C2 - 39538905

AN - SCOPUS:85198250359

SN - 1094-4087

VL - 32

SP - 24728

EP - 24743

JO - Optics Express

JF - Optics Express

IS - 14

ER -

Theoretical analysis of nanoscale local etching of a rough quartz surface under direct illumination

Abstract

Access to Document

Other files and links

Fingerprint

Cite this