The tunable dielectric properties of sputtered yttrium oxide films

Pei Lei; Xiaoting Chen; Yue Yan; Jiaqi Zhu

doi:10.1007/s00339-021-04280-8

The tunable dielectric properties of sputtered yttrium oxide films

Pei Lei^*, Xiaoting Chen, Yue Yan, Jiaqi Zhu

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

6 Citations (Scopus)

Abstract

Yttrium oxide film is an important dielectric material, which has been widely used in the scientific and engineering fields. The microstructures of yttrium oxide films can be modified effectively by adjusting the substrate temperature and bias voltage, which also have effects on dielectric properties of yttrium oxide films. In this work, the dielectric properties of yttrium oxide films grown on Pt film, which exhibit the distinct microstructures with cubic-phase and monoclinic-phase domination manipulated by different substrate temperatures and bias voltages, have been investigated systematically. High substrate temperature as well as large bias voltage can decrease the loss tangent and enhance the dielectric constants up to 56 and 40, respectively. Furthermore, the driven force of temperature is more favorable than that of bias voltage for enhanced dielectric constant due to fewer defects.

Original language	English
Article number	99
Journal	Applied Physics A: Materials Science and Processing
Volume	127
Issue number	2
DOIs	https://doi.org/10.1007/s00339-021-04280-8
Publication status	Published - Feb 2021
Externally published	Yes

Keywords

Dielectric constants
MIM
Magnetron sputtering
Yttrium oxide film

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10.1007/s00339-021-04280-8

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title = "The tunable dielectric properties of sputtered yttrium oxide films",

abstract = "Yttrium oxide film is an important dielectric material, which has been widely used in the scientific and engineering fields. The microstructures of yttrium oxide films can be modified effectively by adjusting the substrate temperature and bias voltage, which also have effects on dielectric properties of yttrium oxide films. In this work, the dielectric properties of yttrium oxide films grown on Pt film, which exhibit the distinct microstructures with cubic-phase and monoclinic-phase domination manipulated by different substrate temperatures and bias voltages, have been investigated systematically. High substrate temperature as well as large bias voltage can decrease the loss tangent and enhance the dielectric constants up to 56 and 40, respectively. Furthermore, the driven force of temperature is more favorable than that of bias voltage for enhanced dielectric constant due to fewer defects.",

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AU - Lei, Pei

AU - Chen, Xiaoting

AU - Yan, Yue

AU - Zhu, Jiaqi

PY - 2021/2

Y1 - 2021/2

N2 - Yttrium oxide film is an important dielectric material, which has been widely used in the scientific and engineering fields. The microstructures of yttrium oxide films can be modified effectively by adjusting the substrate temperature and bias voltage, which also have effects on dielectric properties of yttrium oxide films. In this work, the dielectric properties of yttrium oxide films grown on Pt film, which exhibit the distinct microstructures with cubic-phase and monoclinic-phase domination manipulated by different substrate temperatures and bias voltages, have been investigated systematically. High substrate temperature as well as large bias voltage can decrease the loss tangent and enhance the dielectric constants up to 56 and 40, respectively. Furthermore, the driven force of temperature is more favorable than that of bias voltage for enhanced dielectric constant due to fewer defects.

AB - Yttrium oxide film is an important dielectric material, which has been widely used in the scientific and engineering fields. The microstructures of yttrium oxide films can be modified effectively by adjusting the substrate temperature and bias voltage, which also have effects on dielectric properties of yttrium oxide films. In this work, the dielectric properties of yttrium oxide films grown on Pt film, which exhibit the distinct microstructures with cubic-phase and monoclinic-phase domination manipulated by different substrate temperatures and bias voltages, have been investigated systematically. High substrate temperature as well as large bias voltage can decrease the loss tangent and enhance the dielectric constants up to 56 and 40, respectively. Furthermore, the driven force of temperature is more favorable than that of bias voltage for enhanced dielectric constant due to fewer defects.

KW - Dielectric constants

KW - MIM

KW - Magnetron sputtering

KW - Yttrium oxide film

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The tunable dielectric properties of sputtered yttrium oxide films

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Keywords

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