The enhanced polarization relaxation and excellent high-temperature dielectric properties of N-doped SiC

Yan Kun Dou, Jing Bo Li, Xiao Yong Fang, Hai Bo Jin*, Mao Sheng Cao

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

122 Citations (Scopus)

Abstract

The dielectric properties and microwave attenuation performance of N-doped SiC have been evaluated in 8.2-12.4GHz in the temperature range of 293-673K. The N doping dramatically improves the microwave absorption capability of SiC. The minimum reflection loss of N-doped SiC is enhanced to nearly -30dB with the effective absorption bandwidth [RL(dB) ≤ -10 dB] up to 3GHz at 673K. The excellent high-temperature dielectric properties are attributed to multi-relaxations, originated from the polarization relaxations of dipoles induced by the N doping and vacancy defects.

Original languageEnglish
Article number052102
JournalApplied Physics Letters
Volume104
Issue number5
DOIs
Publication statusPublished - 3 Feb 2014

Fingerprint

Dive into the research topics of 'The enhanced polarization relaxation and excellent high-temperature dielectric properties of N-doped SiC'. Together they form a unique fingerprint.

Cite this