The Effects of N2O and NH3 Plasma Treatment on the Device Performance of Solution-Processed Thin Film Transistors

Xuyang Li; Jin Cheng; Zhinong Yu

doi:10.1002/SDTP.13651

The Effects of N₂O and NH₃ Plasma Treatment on the Device Performance of Solution-Processed Thin Film Transistors

Xuyang Li
, Jin Cheng
, Zhinong Yu

School of Optics and Photonics

Beijing Institute of Technology

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

Original language	English
Title of host publication	Digest of Technical Papers - SID International Symposium
Editors	Baoping Wang, Chi-Ming Che, Ching W. Tang, Han-Ping D. Shieh, Hoi S. Kwok, Hongxing Xu, Ming Liu, Qionghai Dai, Shou Peng, Vivian Wing-Wah Yam, Wei Huang, Xiaomo Wang, Yong Cao, Youliao Zheng, Yue Hao, Yunqi Liu, Zhongcan Ouyang, Zhonglin Wang, Zuyan Xu
Publisher	John Wiley and Sons Inc.
Pages	798
Number of pages	1
Edition	S1
ISBN (Electronic)	9781510896161, 9781510896161, 9781510896161
DOIs	https://doi.org/10.1002/SDTP.13651
Publication status	Published - 2019
Event	International Conference on Display Technology, ICDT 2019 - Suzhou, China Duration: 26 Mar 2019 → 29 Mar 2019

Publication series

Name	Digest of Technical Papers - SID International Symposium
Number	S1
Volume	50
ISSN (Print)	0097-966X
ISSN (Electronic)	2168-0159

Conference

Conference	International Conference on Display Technology, ICDT 2019
Country/Territory	China
City	Suzhou
Period	26/03/19 → 29/03/19

Access to Document

10.1002/SDTP.13651

Cite this

Li, X., Cheng, J., & Yu, Z. (2019). The Effects of N₂O and NH₃ Plasma Treatment on the Device Performance of Solution-Processed Thin Film Transistors. In B. Wang, C.-M. Che, C. W. Tang, H.-P. D. Shieh, H. S. Kwok, H. Xu, M. Liu, Q. Dai, S. Peng, V. W.-W. Yam, W. Huang, X. Wang, Y. Cao, Y. Zheng, Y. Hao, Y. Liu, Z. Ouyang, Z. Wang, & Z. Xu (Eds.), Digest of Technical Papers - SID International Symposium (S1 ed., pp. 798). (Digest of Technical Papers - SID International Symposium; Vol. 50, No. S1). John Wiley and Sons Inc.. https://doi.org/10.1002/SDTP.13651

Li, Xuyang ; Cheng, Jin ; Yu, Zhinong. / The Effects of N₂O and NH₃ Plasma Treatment on the Device Performance of Solution-Processed Thin Film Transistors. Digest of Technical Papers - SID International Symposium. editor / Baoping Wang ; Chi-Ming Che ; Ching W. Tang ; Han-Ping D. Shieh ; Hoi S. Kwok ; Hongxing Xu ; Ming Liu ; Qionghai Dai ; Shou Peng ; Vivian Wing-Wah Yam ; Wei Huang ; Xiaomo Wang ; Yong Cao ; Youliao Zheng ; Yue Hao ; Yunqi Liu ; Zhongcan Ouyang ; Zhonglin Wang ; Zuyan Xu. S1. ed. John Wiley and Sons Inc., 2019. pp. 798 (Digest of Technical Papers - SID International Symposium; S1).

@inproceedings{2db552f3676e4771b0df9faee3162481,

title = "The Effects of N2O and NH3 Plasma Treatment on the Device Performance of Solution-Processed Thin Film Transistors",

author = "Xuyang Li and Jin Cheng and Zhinong Yu",

year = "2019",

doi = "10.1002/SDTP.13651",

language = "English",

series = "Digest of Technical Papers - SID International Symposium",

publisher = "John Wiley and Sons Inc.",

number = "S1",

pages = "798",

editor = "Baoping Wang and Chi-Ming Che and Tang, \{Ching W.\} and Shieh, \{Han-Ping D.\} and Kwok, \{Hoi S.\} and Hongxing Xu and Ming Liu and Qionghai Dai and Shou Peng and Yam, \{Vivian Wing-Wah\} and Wei Huang and Xiaomo Wang and Yong Cao and Youliao Zheng and Yue Hao and Yunqi Liu and Zhongcan Ouyang and Zhonglin Wang and Zuyan Xu",

booktitle = "Digest of Technical Papers - SID International Symposium",

address = "United States",

edition = "S1",

note = "International Conference on Display Technology, ICDT 2019 ; Conference date: 26-03-2019 Through 29-03-2019",

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Li, X, Cheng, J & Yu, Z 2019, The Effects of N₂O and NH₃ Plasma Treatment on the Device Performance of Solution-Processed Thin Film Transistors. in B Wang, C-M Che, CW Tang, H-PD Shieh, HS Kwok, H Xu, M Liu, Q Dai, S Peng, VW-W Yam, W Huang, X Wang, Y Cao, Y Zheng, Y Hao, Y Liu, Z Ouyang, Z Wang & Z Xu (eds), Digest of Technical Papers - SID International Symposium. S1 edn, Digest of Technical Papers - SID International Symposium, no. S1, vol. 50, John Wiley and Sons Inc., pp. 798, International Conference on Display Technology, ICDT 2019, Suzhou, China, 26/03/19. https://doi.org/10.1002/SDTP.13651

The Effects of N₂O and NH₃ Plasma Treatment on the Device Performance of Solution-Processed Thin Film Transistors. / Li, Xuyang; Cheng, Jin; Yu, Zhinong.
Digest of Technical Papers - SID International Symposium. ed. / Baoping Wang; Chi-Ming Che; Ching W. Tang; Han-Ping D. Shieh; Hoi S. Kwok; Hongxing Xu; Ming Liu; Qionghai Dai; Shou Peng; Vivian Wing-Wah Yam; Wei Huang; Xiaomo Wang; Yong Cao; Youliao Zheng; Yue Hao; Yunqi Liu; Zhongcan Ouyang; Zhonglin Wang; Zuyan Xu. S1. ed. John Wiley and Sons Inc., 2019. p. 798 (Digest of Technical Papers - SID International Symposium; Vol. 50, No. S1).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

TY - GEN

T1 - The Effects of N2O and NH3 Plasma Treatment on the Device Performance of Solution-Processed Thin Film Transistors

AU - Li, Xuyang

AU - Cheng, Jin

AU - Yu, Zhinong

PY - 2019

Y1 - 2019

UR - https://www.scopus.com/pages/publications/85134266485

U2 - 10.1002/SDTP.13651

DO - 10.1002/SDTP.13651

M3 - Conference contribution

AN - SCOPUS:85134266485

T3 - Digest of Technical Papers - SID International Symposium

SP - 798

BT - Digest of Technical Papers - SID International Symposium

A2 - Wang, Baoping

A2 - Che, Chi-Ming

A2 - Tang, Ching W.

A2 - Shieh, Han-Ping D.

A2 - Kwok, Hoi S.

A2 - Xu, Hongxing

A2 - Liu, Ming

A2 - Dai, Qionghai

A2 - Peng, Shou

A2 - Yam, Vivian Wing-Wah

A2 - Huang, Wei

A2 - Wang, Xiaomo

A2 - Cao, Yong

A2 - Zheng, Youliao

A2 - Hao, Yue

A2 - Liu, Yunqi

A2 - Ouyang, Zhongcan

A2 - Wang, Zhonglin

A2 - Xu, Zuyan

PB - John Wiley and Sons Inc.

T2 - International Conference on Display Technology, ICDT 2019

Y2 - 26 March 2019 through 29 March 2019

ER -