The Effect of thickness on the properties of TGZO thin films for optoelectronic devices

T. Zhang, H. Wang, Z. Y. Zhong, C. Y. Yang

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

Titanium and gallium co-doped zinc oxide (TGZO) thin films with highly (002)-preferred orientation were grown on glass substrates by magnetron sputtering. The effect of thickness on structure and optical properties of the deposited films were investigated by X-ray diffractometer and spectrophotometer. The results show that the polycrystalline TGZO films consist of the hexagonal crystal structures with c-axis as the preferred growth orientation normal to the substrate, and that the thickness significantly affects the crystal structure and optical properties of the thin films. It is observed that the average transmitance in the wavelength range of the visible spectrum decreases with the increase of thickness. The TGZO thin film with about 900 nm thickness exhibits the maximum grain size, the lowest dislocation density and the minimum micro strain.

Original languageEnglish
Title of host publicationResources and Sustainable Development
Pages2124-2127
Number of pages4
DOIs
Publication statusPublished - 2013
Externally publishedYes
Event2013 2nd International Conference on Energy and Environmental Protection, ICEEP 2013 - Guilin, China
Duration: 19 Apr 201321 Apr 2013

Publication series

NameAdvanced Materials Research
Volume734-737
ISSN (Print)1022-6680

Conference

Conference2013 2nd International Conference on Energy and Environmental Protection, ICEEP 2013
Country/TerritoryChina
CityGuilin
Period19/04/1321/04/13

Keywords

  • Microstructure
  • Optical properties
  • TGZO thin films

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