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Study of Film Discoloration and Moisture Influence in Plasam-Enhanced Sub-Atomsphericic Deposition for CSTIC 2026

  • Hui Li*
  • , Miao He
  • , Lei Wang
  • , Yeliang Wang
  • , Guangquan Lv
  • *Corresponding author for this work
  • Beijing Institute of Technology
  • Engineering Center

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

This study investigates the discoloration phenomenon in plasma-enhanced sub-atmospheric fill (PE-SAF) films, which manifests as visible defects accompanied by reduced film thickness (as measured by focused ion beam scanning electron microscopy, FIB-SEM), significant stoichiometric deviation (characterized via scanning electron microscopy with energy-dispersive X-ray spectroscopy, SEM-EDS), and elevated surface charge (detected by digital surface photovoltage, DSPV). A comprehensive approach combining multiphase simulation and controlled experimentations was employed to elucidate the underlying mechanism. The results indicate that increasing the equipment front-end module (EFEM) pressure differential relative to the external environment from 2.5 - 3 Pa to 7.5 - 8 Pa markedly reduces the incidence of film discoloration, with complete suppression achieved in small-batch tests. This optimization ultimately contributed to a 4% improvement in wafer yield during high-volume production, demonstrating significant practical implications for enhancing quality control in semiconductor manufacturing.

Original languageEnglish
Title of host publication2026 Conference of Science and Technology of Integrated Circuits, CSTIC 2026
EditorsCor Claeys, Bin Yu, Beichao Zhang, Peng Bai, Qianqian Huang, Xiaowei Li, Steve X. Liang, Hsiang-Lan Lung, Linyong Pang, Xinping Qu, Xiaoping Shi, Jianshi Tang, Pingqiang Zhou, Cheng Zhuo
PublisherInstitute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)9798331592745
DOIs
Publication statusPublished - 2026
Event2026 Conference of Science and Technology of Integrated Circuits, CSTIC 2026 - Shanghai, China
Duration: 22 Mar 202624 Mar 2026

Publication series

Name2026 Conference of Science and Technology of Integrated Circuits, CSTIC 2026

Conference

Conference2026 Conference of Science and Technology of Integrated Circuits, CSTIC 2026
Country/TerritoryChina
CityShanghai
Period22/03/2624/03/26

Keywords

  • discoloration
  • EFEM
  • SACVD

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