Statistical simulations of 6T-SRAM cell ageing using a reliability aware simulation flow

Razaidi Hussin, Louis Gerrer, Jie Ding, Liping Wang, Salvatore M. Amoroso, Binjie Cheng, Dave Reid, Pieter Weckx, Marco Simicic, Jacopo Franco, Annelies Vanderheyden, Danielle Vanhaeren, Naoto Horiguchi, Ben Kaczer, Asen Asenov

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

1 Citation (Scopus)

Abstract

This work present the last development of a statistical reliability aware simulation flow from transistors to circuits. A TCAD calibration methodology based on statistical measurement of a 60nm bulk MOSFET is presented. Statistical compact models of fresh and aged transistors are extracted form large ensembles of TCAD simulations results. Compact models representing intermediate stages of degradation, not captured in the TCAD simulations, are interpolated using a proprietary compact model generator. Statistical simulations results for a 6T-SRAM cell aging are presented following various aging scenario for both static noise margin and intrinsic write time.

Original languageEnglish
Title of host publicationESSDERC 2015 - Proceedings of the 45th European Solid-State Device Research Conference
EditorsTibor Grasser, Wolfgang Pribyl, Martin Schrems
PublisherEditions Frontieres
Pages238-241
Number of pages4
ISBN (Electronic)9781467371339
DOIs
Publication statusPublished - 10 Nov 2015
Externally publishedYes
Event45th European Solid-State Device Research Conference, ESSDERC 2015 - Graz, Austria
Duration: 14 Sept 201518 Sept 2015

Publication series

NameEuropean Solid-State Device Research Conference
Volume2015-November
ISSN (Print)1930-8876

Conference

Conference45th European Solid-State Device Research Conference, ESSDERC 2015
Country/TerritoryAustria
CityGraz
Period14/09/1518/09/15

Keywords

  • Aging
  • Degradation
  • Integrated circuit modeling
  • MOS devices
  • Semiconductor process modeling
  • Threshold voltage
  • Transistors

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