Sputtered ITO/Ag/ITO Films: Growth Windows and Ag/ITO Interfacial Properties

Pei Lei; Xiaoting Chen; Yue Yan; Xuan Zhang; Changshan Hao; Jingjing Peng; Jianchao Ji; Yanli Zhong

doi:10.1007/s11664-022-09519-5

Sputtered ITO/Ag/ITO Films: Growth Windows and Ag/ITO Interfacial Properties

Pei Lei^*
, Xiaoting Chen
, Yue Yan
, Xuan Zhang
, Changshan Hao
, Jingjing Peng
, Jianchao Ji
, Yanli Zhong

^*Corresponding author for this work

Beijing Institute of Aeronautical Materials
Leiden University

Research output: Contribution to journal › Article › peer-review

12 Citations (Scopus)

Abstract

Oxide-metal-oxide (OMO) multilayer film has attracted increasing interest due to its high performance, including the high optical transparency and low electric resistivity, and has been considered a promising substitute for the conventional indium tin oxide (ITO) film. In this work, we studied the role of growth parameters for the performance of sputtered ITO/Ag/ITO multilayer film. ITO/Ag/ITO film with superior properties of transmittance of 89.1% and sheet resistance of 8 Ω/□ was prepared. The effects of deviation of film thickness on the optical and properties were investigated systematically. Ultrathin ITO_1−x film with thickness of less than 5 nm covers the active Ag surface to avoid Ag oxidation effectively, resulting in both high transmittance and conductivity. The X-ray photoelectron spectroscopy depth profile analysis indicates the role of ultrathin ITO_1−x film on Ag surface oxidation. This work provides a guideline to fabricate high-quality OMO-based films and devices.

Original language	English
Pages (from-to)	2645-2651
Number of pages	7
Journal	Journal of Electronic Materials
Volume	51
Issue number	5
DOIs	https://doi.org/10.1007/s11664-022-09519-5
Publication status	Published - May 2022
Externally published	Yes

Keywords

Ag oxidation
ITO/Ag/ITO
Transparent conductive multilayer film
magnetron sputtering
optical and electrical properties

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10.1007/s11664-022-09519-5

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@article{e834e7809b5045f0b995e764f787b7e5,

title = "Sputtered ITO/Ag/ITO Films: Growth Windows and Ag/ITO Interfacial Properties",

abstract = "Oxide-metal-oxide (OMO) multilayer film has attracted increasing interest due to its high performance, including the high optical transparency and low electric resistivity, and has been considered a promising substitute for the conventional indium tin oxide (ITO) film. In this work, we studied the role of growth parameters for the performance of sputtered ITO/Ag/ITO multilayer film. ITO/Ag/ITO film with superior properties of transmittance of 89.1\% and sheet resistance of 8 Ω/□ was prepared. The effects of deviation of film thickness on the optical and properties were investigated systematically. Ultrathin ITO1−x film with thickness of less than 5 nm covers the active Ag surface to avoid Ag oxidation effectively, resulting in both high transmittance and conductivity. The X-ray photoelectron spectroscopy depth profile analysis indicates the role of ultrathin ITO1−x film on Ag surface oxidation. This work provides a guideline to fabricate high-quality OMO-based films and devices.",

keywords = "Ag oxidation, ITO/Ag/ITO, Transparent conductive multilayer film, magnetron sputtering, optical and electrical properties",

author = "Pei Lei and Xiaoting Chen and Yue Yan and Xuan Zhang and Changshan Hao and Jingjing Peng and Jianchao Ji and Yanli Zhong",

note = "Publisher Copyright: {\textcopyright} 2022, The Minerals, Metals \& Materials Society.",

year = "2022",

month = may,

doi = "10.1007/s11664-022-09519-5",

language = "English",

volume = "51",

pages = "2645--2651",

journal = "Journal of Electronic Materials",

issn = "0361-5235",

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TY - JOUR

T1 - Sputtered ITO/Ag/ITO Films

T2 - Growth Windows and Ag/ITO Interfacial Properties

AU - Lei, Pei

AU - Chen, Xiaoting

AU - Yan, Yue

AU - Zhang, Xuan

AU - Hao, Changshan

AU - Peng, Jingjing

AU - Ji, Jianchao

AU - Zhong, Yanli

PY - 2022/5

Y1 - 2022/5

N2 - Oxide-metal-oxide (OMO) multilayer film has attracted increasing interest due to its high performance, including the high optical transparency and low electric resistivity, and has been considered a promising substitute for the conventional indium tin oxide (ITO) film. In this work, we studied the role of growth parameters for the performance of sputtered ITO/Ag/ITO multilayer film. ITO/Ag/ITO film with superior properties of transmittance of 89.1% and sheet resistance of 8 Ω/□ was prepared. The effects of deviation of film thickness on the optical and properties were investigated systematically. Ultrathin ITO1−x film with thickness of less than 5 nm covers the active Ag surface to avoid Ag oxidation effectively, resulting in both high transmittance and conductivity. The X-ray photoelectron spectroscopy depth profile analysis indicates the role of ultrathin ITO1−x film on Ag surface oxidation. This work provides a guideline to fabricate high-quality OMO-based films and devices.

AB - Oxide-metal-oxide (OMO) multilayer film has attracted increasing interest due to its high performance, including the high optical transparency and low electric resistivity, and has been considered a promising substitute for the conventional indium tin oxide (ITO) film. In this work, we studied the role of growth parameters for the performance of sputtered ITO/Ag/ITO multilayer film. ITO/Ag/ITO film with superior properties of transmittance of 89.1% and sheet resistance of 8 Ω/□ was prepared. The effects of deviation of film thickness on the optical and properties were investigated systematically. Ultrathin ITO1−x film with thickness of less than 5 nm covers the active Ag surface to avoid Ag oxidation effectively, resulting in both high transmittance and conductivity. The X-ray photoelectron spectroscopy depth profile analysis indicates the role of ultrathin ITO1−x film on Ag surface oxidation. This work provides a guideline to fabricate high-quality OMO-based films and devices.

KW - Ag oxidation

KW - ITO/Ag/ITO

KW - Transparent conductive multilayer film

KW - magnetron sputtering

KW - optical and electrical properties

UR - https://www.scopus.com/pages/publications/85125775577

U2 - 10.1007/s11664-022-09519-5

DO - 10.1007/s11664-022-09519-5

M3 - Article

AN - SCOPUS:85125775577

SN - 0361-5235

VL - 51

SP - 2645

EP - 2651

JO - Journal of Electronic Materials

JF - Journal of Electronic Materials

IS - 5

ER -

Sputtered ITO/Ag/ITO Films: Growth Windows and Ag/ITO Interfacial Properties

Abstract

Keywords

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