TY - JOUR
T1 - Sputtered ITO/Ag/ITO Films
T2 - Growth Windows and Ag/ITO Interfacial Properties
AU - Lei, Pei
AU - Chen, Xiaoting
AU - Yan, Yue
AU - Zhang, Xuan
AU - Hao, Changshan
AU - Peng, Jingjing
AU - Ji, Jianchao
AU - Zhong, Yanli
N1 - Publisher Copyright:
© 2022, The Minerals, Metals & Materials Society.
PY - 2022/5
Y1 - 2022/5
N2 - Oxide-metal-oxide (OMO) multilayer film has attracted increasing interest due to its high performance, including the high optical transparency and low electric resistivity, and has been considered a promising substitute for the conventional indium tin oxide (ITO) film. In this work, we studied the role of growth parameters for the performance of sputtered ITO/Ag/ITO multilayer film. ITO/Ag/ITO film with superior properties of transmittance of 89.1% and sheet resistance of 8 Ω/□ was prepared. The effects of deviation of film thickness on the optical and properties were investigated systematically. Ultrathin ITO1−x film with thickness of less than 5 nm covers the active Ag surface to avoid Ag oxidation effectively, resulting in both high transmittance and conductivity. The X-ray photoelectron spectroscopy depth profile analysis indicates the role of ultrathin ITO1−x film on Ag surface oxidation. This work provides a guideline to fabricate high-quality OMO-based films and devices.
AB - Oxide-metal-oxide (OMO) multilayer film has attracted increasing interest due to its high performance, including the high optical transparency and low electric resistivity, and has been considered a promising substitute for the conventional indium tin oxide (ITO) film. In this work, we studied the role of growth parameters for the performance of sputtered ITO/Ag/ITO multilayer film. ITO/Ag/ITO film with superior properties of transmittance of 89.1% and sheet resistance of 8 Ω/□ was prepared. The effects of deviation of film thickness on the optical and properties were investigated systematically. Ultrathin ITO1−x film with thickness of less than 5 nm covers the active Ag surface to avoid Ag oxidation effectively, resulting in both high transmittance and conductivity. The X-ray photoelectron spectroscopy depth profile analysis indicates the role of ultrathin ITO1−x film on Ag surface oxidation. This work provides a guideline to fabricate high-quality OMO-based films and devices.
KW - Ag oxidation
KW - ITO/Ag/ITO
KW - Transparent conductive multilayer film
KW - magnetron sputtering
KW - optical and electrical properties
UR - http://www.scopus.com/inward/record.url?scp=85125775577&partnerID=8YFLogxK
U2 - 10.1007/s11664-022-09519-5
DO - 10.1007/s11664-022-09519-5
M3 - Article
AN - SCOPUS:85125775577
SN - 0361-5235
VL - 51
SP - 2645
EP - 2651
JO - Journal of Electronic Materials
JF - Journal of Electronic Materials
IS - 5
ER -