Split nanofocusing spots beyond diffraction limit via a new near-field plasmonic structure

Zhe Guo, Yanqiu Li, Yanjun Chen

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

The focusing spot beyond diffraction limit is critical to plasmonic direct-writing lithography. To improve the speed and precision of plasmonic direct-writing lithography, we design a new periodically repeated circular hole/elliptical ring plasmonic structure named as split-focusing structure used for producing two focusing spots under the incidence of linearly polarized plane wave at 633nm wavelength. It consists of SiO2 infstrate and coated silver film with holes and slits of different shapes. By designing appropriate structure parameters to excite localized surface plasmon resonance, two split infwavelength spots are produced on the focal plane. Finite-difference time-domain (FDTD) method is used for numerical simulation. The simulation result indicates that the focal length of structure is 36nm and the full width at half maximum (FWHM) of single spot is 50nm. Both split spots can be used for direct writing so the speed of photoetching will be raised. The dual spots are both in circular shape, which is beneficial to improve the pattern precision. The influence of structure parameters on focusing performance is also analyzed to guide the practical fabrication of structure. The split-focusing structure designed in this paper also owns application values in data storage and non-contact sensing.

Original languageEnglish
Title of host publicationMicro-Optics and MOEMS
EditorsHuikai Xie, Yuelin Wang
PublisherSPIE
ISBN (Electronic)9781510623385
DOIs
Publication statusPublished - 2018
EventInternational Symposium on Optoelectronic Technology and Application 2018: Micro-Optics and MOEMS, OTA 2018 - Beijing, China
Duration: 22 May 201824 May 2018

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume10848
ISSN (Print)0277-786X
ISSN (Electronic)1996-756X

Conference

ConferenceInternational Symposium on Optoelectronic Technology and Application 2018: Micro-Optics and MOEMS, OTA 2018
Country/TerritoryChina
CityBeijing
Period22/05/1824/05/18

Keywords

  • Localized surface plasmon
  • Nanolithography
  • Plasmonic structure

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