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Seeing What Matters: Empowering CLIP with Patch Generation-to-Selection

  • Gensheng Pei
  • , Tao Chen
  • , Yujia Wang
  • , Xinhao Cai
  • , Xiangbo Shu
  • , Tianfei Zhou
  • , Yazhou Yao*
  • *Corresponding author for this work
  • Nanjing University of Science and Technology
  • Zhejiang Sci-Tech University

Research output: Contribution to journalConference articlepeer-review

Abstract

The CLIP model has demonstrated significant advancements in aligning visual and language modalities through large-scale pre-training on image-text pairs, enabling strong zero-shot classification and retrieval capabilities on various domains. However, CLIP’s training remains computationally intensive, with high demands on both data processing and memory. To address these challenges, recent masking strategies have emerged, focusing on the selective removal of image patches to improve training efficiency. Although effective, these methods often compromise key semantic information, resulting in suboptimal alignment between visual features and text descriptions. In this work, we present a concise yet effective approach called Patch Generation-to-Selection (CLIP-PGS) to enhance CLIP’s training efficiency while preserving critical semantic content. Our method introduces a gradual masking process in which a small set of candidate patches is first pre-selected as potential mask regions. Then, we apply Sobel edge detection across the entire image to generate an edge mask that prioritizes the retention of the primary object areas. Finally, similarity scores between the candidate mask patches and their neighboring patches are computed, with optimal transport normalization refining the selection process to ensure a balanced similarity matrix. Our approach, CLIP-PGS, sets new state-of-the-art results in zero-shot classification and retrieval tasks, achieving superior performance in robustness evaluation and language compositionality benchmarks.

Original languageEnglish
Pages (from-to)24862-24872
Number of pages11
JournalProceedings of the IEEE Computer Society Conference on Computer Vision and Pattern Recognition
DOIs
Publication statusPublished - 2025
Event2025 IEEE/CVF Conference on Computer Vision and Pattern Recognition, CVPR 2025 - Nashville, United States
Duration: 11 Jun 202515 Jun 2025

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