Scalability Study on Fcrroclcctric-HfO2 Tunnel Junction Memory Based on Non-equilibrium Green Function Method with Self-consistent Potential

Fei Mo, Yusaku Tagawa, Takuya Saraya, Toshiro Hiramoto, Masaharu Kobayashi

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

32 Citations (Scopus)

Abstract

We have investigated scalability and design guideline of HfO2-bascd Ferroelectric Tunnel Junction (FTJ) memory by employing numerical simulation which is based on Non-Equilibrium Green Function (NEGF) method and self-consistent potential, and calibrated by our experimental FTJ data, for the first time. Metal-Ferroelectric-Insulator-semiconductor (MFIS) FTJ shows a higher TER than Metal-Ferroelectric-Insulator-Metal (MFIM) FTJ with almost the same read current because of the large asymmetry of dielectric screening property in top and bottom electrodes. High read current can be obtained by thinner layers while high TER and low depolarizing field are maintained by adjusting bottom semiconductor electrode property. Based on these results, a guideline for designing MFIS structure FTJ to achieve high read current and high TER has been proposed. We have shown a potential for scaling the FTJ down to sub-20 nm diameter.

Original languageEnglish
Title of host publication2018 IEEE International Electron Devices Meeting, IEDM 2018
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages16.3.1-16.3.4
ISBN (Electronic)9781728119878
DOIs
Publication statusPublished - 2 Jul 2018
Externally publishedYes
Event64th Annual IEEE International Electron Devices Meeting, IEDM 2018 - San Francisco, United States
Duration: 1 Dec 20185 Dec 2018

Publication series

NameTechnical Digest - International Electron Devices Meeting, IEDM
Volume2018-December
ISSN (Print)0163-1918

Conference

Conference64th Annual IEEE International Electron Devices Meeting, IEDM 2018
Country/TerritoryUnited States
CitySan Francisco
Period1/12/185/12/18

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