Abstract
Electrochemical behavior of Ti-Al-Zr implanted with nickel and tantalum ions and a co-implantation of them was investigated as a function of fluences. The polarization curves of the un-implanted and implanted Ti-Al-Zr were potentiodynamically measured in a hydrochloric acid solution. Electrochemical measurements revealed that nickel ion implantation significantly promoted the passivation of Ti-Al-Zr with an increase of fluence and the corrosion potentials resided in the passive region at fluences above 1 × 1016 ions/cm2. Tantalum ion implantation was effective in reducing the anodic current densities in the active and passive regions as fluences increased. On the other hand, the polarization curves of the co-implanted Ti-Al-Zr exhibited more stable passive behavior with low current densities. It was concluded that an excellent corrosion resistance of Ti-Al-Zr was achieved by complementary effects of nickel and tantalum ions co-implantation.
| Original language | English |
|---|---|
| Pages (from-to) | 7538-7543 |
| Number of pages | 6 |
| Journal | Surface and Coatings Technology |
| Volume | 201 |
| Issue number | 16-17 |
| DOIs | |
| Publication status | Published - 21 May 2007 |
| Externally published | Yes |
Keywords
- Corrosion resistance
- Ion implantation
- Ti-Al-Zr alloy
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