Role of tantalum and nickel ion implantation on corrosion resistance properties of a Ti-Al-Zr alloy

Y. Z. Liu, X. T. Zu*, R. Tang, X. Xiang, L. Wang, W. G. Ma

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

2 Citations (Scopus)

Abstract

Electrochemical behavior of Ti-Al-Zr implanted with nickel and tantalum ions and a co-implantation of them was investigated as a function of fluences. The polarization curves of the un-implanted and implanted Ti-Al-Zr were potentiodynamically measured in a hydrochloric acid solution. Electrochemical measurements revealed that nickel ion implantation significantly promoted the passivation of Ti-Al-Zr with an increase of fluence and the corrosion potentials resided in the passive region at fluences above 1 × 1016 ions/cm2. Tantalum ion implantation was effective in reducing the anodic current densities in the active and passive regions as fluences increased. On the other hand, the polarization curves of the co-implanted Ti-Al-Zr exhibited more stable passive behavior with low current densities. It was concluded that an excellent corrosion resistance of Ti-Al-Zr was achieved by complementary effects of nickel and tantalum ions co-implantation.

Original languageEnglish
Pages (from-to)7538-7543
Number of pages6
JournalSurface and Coatings Technology
Volume201
Issue number16-17
DOIs
Publication statusPublished - 21 May 2007
Externally publishedYes

Keywords

  • Corrosion resistance
  • Ion implantation
  • Ti-Al-Zr alloy

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