Role of aluminum ion implantation on microstructure, microhardness and corrosion properties of titanium alloy

Y. Z. Liu; X. T. Zu; L. Wang; S. Y. Qiu

doi:10.1016/j.vacuum.2008.04.076

Role of aluminum ion implantation on microstructure, microhardness and corrosion properties of titanium alloy

Y. Z. Liu^*
, X. T. Zu
, L. Wang
, S. Y. Qiu

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

10 Citations (Scopus)

Abstract

Ti-Al-Zr alloy was implanted with Al at cumulative doses between 1 × 10¹⁷ and 1 × 10¹⁸ ions/cm². The results indicate that the Al-implanted layers are ∼0.1 μm thick and are composed almost entirely of an amorphous layer. Implanted layer hardness is dose dependent and is increased by more than a factor of 4 for the high-dose implanted specimen when compared with that of the substrate material. The corrosion resistance of the sample was markedly improved after aluminum implantation.

Original language	English
Pages (from-to)	444-447
Number of pages	4
Journal	Vacuum
Volume	83
Issue number	2
DOIs	https://doi.org/10.1016/j.vacuum.2008.04.076
Publication status	Published - 26 Sept 2008
Externally published	Yes

Keywords

Aluminum ion implantation
Corrosion resistance
Ti-Al-Zr

Access to Document

10.1016/j.vacuum.2008.04.076

Cite this

@article{57dbbd54510a4a6ea8d92ce0c886ad1e,

title = "Role of aluminum ion implantation on microstructure, microhardness and corrosion properties of titanium alloy",

abstract = "Ti-Al-Zr alloy was implanted with Al at cumulative doses between 1 × 1017 and 1 × 1018 ions/cm2. The results indicate that the Al-implanted layers are ∼0.1 μm thick and are composed almost entirely of an amorphous layer. Implanted layer hardness is dose dependent and is increased by more than a factor of 4 for the high-dose implanted specimen when compared with that of the substrate material. The corrosion resistance of the sample was markedly improved after aluminum implantation.",

keywords = "Aluminum ion implantation, Corrosion resistance, Ti-Al-Zr",

author = "Liu, \{Y. Z.\} and Zu, \{X. T.\} and L. Wang and Qiu, \{S. Y.\}",

year = "2008",

month = sep,

day = "26",

doi = "10.1016/j.vacuum.2008.04.076",

language = "English",

volume = "83",

pages = "444--447",

journal = "Vacuum",

issn = "0042-207X",

publisher = "Elsevier Ltd.",

number = "2",

}

TY - JOUR

T1 - Role of aluminum ion implantation on microstructure, microhardness and corrosion properties of titanium alloy

AU - Liu, Y. Z.

AU - Zu, X. T.

AU - Wang, L.

AU - Qiu, S. Y.

PY - 2008/9/26

Y1 - 2008/9/26

N2 - Ti-Al-Zr alloy was implanted with Al at cumulative doses between 1 × 1017 and 1 × 1018 ions/cm2. The results indicate that the Al-implanted layers are ∼0.1 μm thick and are composed almost entirely of an amorphous layer. Implanted layer hardness is dose dependent and is increased by more than a factor of 4 for the high-dose implanted specimen when compared with that of the substrate material. The corrosion resistance of the sample was markedly improved after aluminum implantation.

AB - Ti-Al-Zr alloy was implanted with Al at cumulative doses between 1 × 1017 and 1 × 1018 ions/cm2. The results indicate that the Al-implanted layers are ∼0.1 μm thick and are composed almost entirely of an amorphous layer. Implanted layer hardness is dose dependent and is increased by more than a factor of 4 for the high-dose implanted specimen when compared with that of the substrate material. The corrosion resistance of the sample was markedly improved after aluminum implantation.

KW - Aluminum ion implantation

KW - Corrosion resistance

KW - Ti-Al-Zr

UR - https://www.scopus.com/pages/publications/51249100654

U2 - 10.1016/j.vacuum.2008.04.076

DO - 10.1016/j.vacuum.2008.04.076

M3 - Article

AN - SCOPUS:51249100654

SN - 0042-207X

VL - 83

SP - 444

EP - 447

JO - Vacuum

JF - Vacuum

IS - 2

ER -

Role of aluminum ion implantation on microstructure, microhardness and corrosion properties of titanium alloy

Abstract

Keywords

Access to Document

Other files and links

Fingerprint

Cite this