TY - JOUR
T1 - Reverse engineering from spectrophotometric measurements
T2 - Performances and efficiency of different optimization algorithms
AU - Gao, Lihong
AU - Lemarchand, Fabien
AU - Lequime, Michel
PY - 2012/9
Y1 - 2012/9
N2 - A large number of parameters is often required to describe optical dispersion laws, and it is only through the use of an appropriate global optimization procedure that an accurate thin-film index determination can be achieved. In this paper, we propose to investigate the respective performances of three different optimization algorithms, namely Simulated Annealing, Genetic Algorithm and Clustering Global Optimization and compare results with a commercial software dedicated to thin-film index determination. This study is restricted to the single-layer thin-film index determination of transparent and absorbing materials. It includes the theoretical study of simulated reflection and transmission spectra, and the experimental characterization of Ta 2O 5 and Si layers.
AB - A large number of parameters is often required to describe optical dispersion laws, and it is only through the use of an appropriate global optimization procedure that an accurate thin-film index determination can be achieved. In this paper, we propose to investigate the respective performances of three different optimization algorithms, namely Simulated Annealing, Genetic Algorithm and Clustering Global Optimization and compare results with a commercial software dedicated to thin-film index determination. This study is restricted to the single-layer thin-film index determination of transparent and absorbing materials. It includes the theoretical study of simulated reflection and transmission spectra, and the experimental characterization of Ta 2O 5 and Si layers.
UR - http://www.scopus.com/inward/record.url?scp=84865231847&partnerID=8YFLogxK
U2 - 10.1007/s00339-012-6987-2
DO - 10.1007/s00339-012-6987-2
M3 - Article
AN - SCOPUS:84865231847
SN - 0947-8396
VL - 108
SP - 877
EP - 889
JO - Applied Physics A: Materials Science and Processing
JF - Applied Physics A: Materials Science and Processing
IS - 4
ER -