Research on vacuum stage technologies for extreme ultraviolet lithography

Tao Zhu; Yan Qiu Li

Research on vacuum stage technologies for extreme ultraviolet lithography

Tao Zhu^*
, Yan Qiu Li

^*Corresponding author for this work

CAS - Institute of Electrical Engineering

Research output: Contribution to journal › Article › peer-review

Abstract

Vacuum stage is a key subsystem of Extreme Ultraviolet Lithography. Its accuracy, velocity, acceleration, as well as dynamic positioning and synchronous scanning performances affect the image quality, overlay accuracy and throughput of the whole machine greatly. Based on the working principles and state-of-the-art developments of EUVL, the characteristics, construction and key technologies for vacuum stage system of EUVL are investigated.

Original language	English
Pages (from-to)	32-37
Number of pages	6
Journal	Weixi Jiagong Jishu/Microfabrication Technology
Issue number	1
Publication status	Published - Mar 2005
Externally published	Yes

Keywords

Control
Extreme Ultraviolet Lithography(EUVL)
Stage
Vacuum

Cite this

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title = "Research on vacuum stage technologies for extreme ultraviolet lithography",

abstract = "Vacuum stage is a key subsystem of Extreme Ultraviolet Lithography. Its accuracy, velocity, acceleration, as well as dynamic positioning and synchronous scanning performances affect the image quality, overlay accuracy and throughput of the whole machine greatly. Based on the working principles and state-of-the-art developments of EUVL, the characteristics, construction and key technologies for vacuum stage system of EUVL are investigated.",

keywords = "Control, Extreme Ultraviolet Lithography(EUVL), Stage, Vacuum",

author = "Tao Zhu and Li, \{Yan Qiu\}",

year = "2005",

month = mar,

language = "English",

pages = "32--37",

journal = "Weixi Jiagong Jishu/Microfabrication Technology",

issn = "1003-8213",

publisher = "Weixi Jiagong Jishu",

number = "1",

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TY - JOUR

T1 - Research on vacuum stage technologies for extreme ultraviolet lithography

AU - Zhu, Tao

AU - Li, Yan Qiu

PY - 2005/3

Y1 - 2005/3

N2 - Vacuum stage is a key subsystem of Extreme Ultraviolet Lithography. Its accuracy, velocity, acceleration, as well as dynamic positioning and synchronous scanning performances affect the image quality, overlay accuracy and throughput of the whole machine greatly. Based on the working principles and state-of-the-art developments of EUVL, the characteristics, construction and key technologies for vacuum stage system of EUVL are investigated.

AB - Vacuum stage is a key subsystem of Extreme Ultraviolet Lithography. Its accuracy, velocity, acceleration, as well as dynamic positioning and synchronous scanning performances affect the image quality, overlay accuracy and throughput of the whole machine greatly. Based on the working principles and state-of-the-art developments of EUVL, the characteristics, construction and key technologies for vacuum stage system of EUVL are investigated.

KW - Control

KW - Extreme Ultraviolet Lithography(EUVL)

KW - Stage

KW - Vacuum

UR - https://www.scopus.com/pages/publications/18744409325

M3 - Article

AN - SCOPUS:18744409325

SN - 1003-8213

SP - 32

EP - 37

JO - Weixi Jiagong Jishu/Microfabrication Technology

JF - Weixi Jiagong Jishu/Microfabrication Technology

IS - 1

ER -

Research on vacuum stage technologies for extreme ultraviolet lithography

Abstract

Keywords

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