Recent progress in photolithography technique to fabricate micro-supercapacitors

Wearable microelectronics are urging for micro energy storage devices to supply power. Micro-supercapacitor (MSC), as a newly developed micro energy storage unit, is attracting wide attentions due to its high-power density, long cycle life and easily integrating planar structure. For the current micro and nano fabrication technology, it is still a huge challenge to manufacture thousands even millions of MSC precisely on highly integrated micro systems within square millimeters or micrometers footprint. Recent studies have developed traditional photolithography and improved the photolithography technologies to achieve high resolution and excellent energy storage performance of MSC on chips, which are noticed by few people. In view of this, we summarize the state-of-the-art photolithography technology, and focus on the advanced photolithography technology to fabricate MSC from the aspects of process, principles, materials, etc. Besides, we also introduce photolithography-based MSC applications in microelectronics. Finally, challenges and perspectives of photolithography-processed MSC are discussed, aiming to provide a valuable technology reference for future MSC-powered integrated microelectronic chips.