Preparation of grass-like GaN nanostructures: Its PL and excellent field emission properties

Ghulam Nabi, Chuanbao Cao*, Waheed S. Khan, Sajad Hussain, Zahid Usman, Noor Abass Din Khattak, Zulfiqar Ali, Faheem K. Butt, Sajjad Hussain Shah, Muhammad Safdar

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

28 Citations (Scopus)

Abstract

We here report highly pure and single crystalline grass-like gallium nitride (GaN) nanostructures obtained on silicon substrate via catalyst-assisted CVD route under NH3 atmosphere inside horizontal tube furnace (HTF) by pre-treating the precursors with aqueous NH3. The as-obtained GaN nanostructures were characterized by XRD, SEM, EDS, HRTEM and SAED. The field emission (FE) characteristics of grass-like GaN nanostructures exhibited a turn-on field of 7.82 V μm- 1 and a threshold field of 8.96 V μm- 1 which are quite reasonable for applications in electron emission devices, field emission displays and vacuum microelectronic devices. Room temperature photoluminescence (PL) measurements of grass-like GaN nanostructures exhibited a strong near-band-edge emission at 368.8 nm (3.36 eV) without any defects related emissions which shows its potential applications in optoelectronics.

Original languageEnglish
Pages (from-to)50-53
Number of pages4
JournalMaterials Letters
Volume66
Issue number1
DOIs
Publication statusPublished - 1 Jan 2012

Keywords

  • Chemical vapor deposition
  • Field emission properties
  • Grass-like GaN
  • Semiconductors

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