Polarization aberration analysis of optical systems

Ying Zhang*, Lin Li, Yi Fan Huang

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

3 Citations (Scopus)

Abstract

Polarization aberration is one of the most important factors affecting the performance of optical systems, especially in systems which are 'polarization critical ones'. Polarization aberration theory, methods of polarization ray tracing, polarization aberration analysis of rotationally symmetric optical systems, polarization aberration analysis of tilted and decentered optical systems are described. Important effects of thin film design on polarization aberrations are also discussed. Finally, several methods which can improve the polarization accuracy of any optical systems are presented, including keeping the angles of incidence as small as possible, optimizing the coating design and balancing aberrations against each other.

Original languageEnglish
Pages (from-to)202-205+207
JournalGuangxue Jishu/Optical Technique
Volume31
Issue number2
Publication statusPublished - Mar 2005

Keywords

  • Optical design
  • Optical thin films
  • Polarization aberration
  • Polarization ray tracing

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