Polar topological materials and devices: Prospects and challenges

Polar topologies possess immense potential to revolutionize ferroelectric technology by offering nontrivial polarization configurations and a range of emergent functionalities, including unique resistive properties, negative capacitance, chirality, and ferroelectricity. Recent advancements in synthesis and characterization techniques have significantly accelerated the exploration of novel polar topological textures. This review highlights key milestones in expanding the topological family, manipulating polar topological textures through multi-field strategies, and uncovering their extraordinary functionalities, while also emphasizing future challenges and research directions. We examine the theoretical foundations and development of polar topological structures in ferroelectric materials, addressing the challenges of experimental realization and the current limitations in understanding multi-field-driven topological phase transitions, which have hindered practical implementation. Finally, this review outlines the scientific and technological prospects of polar topological structures, emphasizing their critical role in advancing materials science and device technology. We hope this review will inspire intensified research efforts that align closely with the practical applications of polar topological structures.