Pigment-dispersed resists for color filters

Jinmei Fu; Yong Li; Jinliang Guo; Hongjin Gao

doi:10.1117/12.319659

Pigment-dispersed resists for color filters

Jinmei Fu^*, Yong Li, Jinliang Guo, Hongjin Gao

^*Corresponding author for this work

Tsinghua University

Research output: Contribution to journal › Conference article › peer-review

4 Citations (Scopus)

Abstract

Water-soluble pigment-dispersed resist systems of red, blue, and green were developed using a high polymer as dispersing agent. The color filters formed from the color resists have high photosensitivity, high resolution, high transparency and chromaticity that meets the requirements of color display. The formation of microimage depends not only on the degree of photo-crosslink of polyvinyl alcohol/stylpyridinium (PVA-SbQ), but also on the adhesion of color filter to the glass substrate. The reduction of photoreaction speed of the color resists is caused by the pigments' absorption of UV light. The adhesion between the color filter and glass surface depends on the amount of hydrogen bonds formed between them.

Original language	English
Pages (from-to)	116-121
Number of pages	6
Journal	Proceedings of SPIE - The International Society for Optical Engineering
Volume	3560
DOIs	https://doi.org/10.1117/12.319659
Publication status	Published - 1998
Externally published	Yes
Event	Display Devices and Systems II - Beijing, China Duration: 16 Sept 1998 → 17 Sept 1998

Keywords

Color filter
Liquid crystal display
Pigment-dispersed resist

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10.1117/12.319659

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title = "Pigment-dispersed resists for color filters",

abstract = "Water-soluble pigment-dispersed resist systems of red, blue, and green were developed using a high polymer as dispersing agent. The color filters formed from the color resists have high photosensitivity, high resolution, high transparency and chromaticity that meets the requirements of color display. The formation of microimage depends not only on the degree of photo-crosslink of polyvinyl alcohol/stylpyridinium (PVA-SbQ), but also on the adhesion of color filter to the glass substrate. The reduction of photoreaction speed of the color resists is caused by the pigments' absorption of UV light. The adhesion between the color filter and glass surface depends on the amount of hydrogen bonds formed between them.",

keywords = "Color filter, Liquid crystal display, Pigment-dispersed resist",

author = "Jinmei Fu and Yong Li and Jinliang Guo and Hongjin Gao",

year = "1998",

doi = "10.1117/12.319659",

language = "English",

volume = "3560",

pages = "116--121",

journal = "Proceedings of SPIE - The International Society for Optical Engineering",

issn = "0277-786X",

publisher = "SPIE",

note = "Display Devices and Systems II ; Conference date: 16-09-1998 Through 17-09-1998",

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TY - JOUR

T1 - Pigment-dispersed resists for color filters

AU - Fu, Jinmei

AU - Li, Yong

AU - Guo, Jinliang

AU - Gao, Hongjin

PY - 1998

Y1 - 1998

N2 - Water-soluble pigment-dispersed resist systems of red, blue, and green were developed using a high polymer as dispersing agent. The color filters formed from the color resists have high photosensitivity, high resolution, high transparency and chromaticity that meets the requirements of color display. The formation of microimage depends not only on the degree of photo-crosslink of polyvinyl alcohol/stylpyridinium (PVA-SbQ), but also on the adhesion of color filter to the glass substrate. The reduction of photoreaction speed of the color resists is caused by the pigments' absorption of UV light. The adhesion between the color filter and glass surface depends on the amount of hydrogen bonds formed between them.

AB - Water-soluble pigment-dispersed resist systems of red, blue, and green were developed using a high polymer as dispersing agent. The color filters formed from the color resists have high photosensitivity, high resolution, high transparency and chromaticity that meets the requirements of color display. The formation of microimage depends not only on the degree of photo-crosslink of polyvinyl alcohol/stylpyridinium (PVA-SbQ), but also on the adhesion of color filter to the glass substrate. The reduction of photoreaction speed of the color resists is caused by the pigments' absorption of UV light. The adhesion between the color filter and glass surface depends on the amount of hydrogen bonds formed between them.

KW - Color filter

KW - Liquid crystal display

KW - Pigment-dispersed resist

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U2 - 10.1117/12.319659

DO - 10.1117/12.319659

M3 - Conference article

AN - SCOPUS:0037738657

SN - 0277-786X

VL - 3560

SP - 116

EP - 121

JO - Proceedings of SPIE - The International Society for Optical Engineering

JF - Proceedings of SPIE - The International Society for Optical Engineering

T2 - Display Devices and Systems II

Y2 - 16 September 1998 through 17 September 1998

ER -

Pigment-dispersed resists for color filters

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Keywords

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