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Novel way of measuring the multilayer reflectivity utilizing the symmetrical output of XRL in plasma

  • Tao Cheng*
  • , Wen Zhong Huang
  • , Li Min Meng
  • , Ying Jun Li
  • , Jing Zhao
  • , Jie Zhang
  • *Corresponding author for this work
  • China University of Mining & Technology, Beijing
  • CAS - Institute of Physics
  • China Academy of Engineering Physics

Research output: Contribution to journalArticlepeer-review

Abstract

A novel way of measuring the reflectivity of multilayer was proposed. Utilizing the symmetrical output of the X-ray laser in slab laser-plasma, the reflectivity could be conveniently obtained in this way. It was also given the setup parameters by calculation according to the demand of precise considering the absorption of X-ray laser by plasma. Under which an experiment of measuring the reflectivity of Mo/Si and Mo/Mg was carried out.

Original languageEnglish
Pages (from-to)2288-2291
Number of pages4
JournalGuangzi Xuebao/Acta Photonica Sinica
Volume37
Issue number11
Publication statusPublished - Nov 2008
Externally publishedYes

Keywords

  • Absorption
  • Multilayers
  • Plasma
  • Reflectivity
  • X-ray laser

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