Nano polishing of a rough quartz surface: Numerical calculation of surface evolution

Vasyl Kanevskii; Serhii Kolienov; Valerii Grygoruk; Ivan Voiteshenko; Oleksandr Stelmakh; Yue Wu; Hao Zhang

doi:10.1016/j.rinp.2025.108187

Nano polishing of a rough quartz surface: Numerical calculation of surface evolution

Vasyl Kanevskii
, Serhii Kolienov
, Valerii Grygoruk
, Ivan Voiteshenko
, Oleksandr Stelmakh
, Yue Wu^*
, Hao Zhang

^*Corresponding author for this work

School of Mechanical Engineering

Research output: Contribution to journal › Article › peer-review

Abstract

A numerical 3D model of nano-local photochemical etching for polishing a rough quartz surface has been developed. This surface is illuminated from the quartz side at the critical angle of total internal reflection. The light source is a laser coherent monochromatic radiation with linear polarization, and the electric field strength vector lies in the plane of light incidence. The model uses a numerical solution of the Helmholtz equation using the finite elements method. The proposed model allows to describe the evolution of etching of a rough surface and obtain a subnano-meter level of surface roughness. The results of calculation show that the use of two independent sources of linearly polarized laser radiation provides the required level of surface roughness and increases the efficiency of the model compared to direct illumination.

Original language	English
Article number	108187
Journal	Results in Physics
Volume	71
DOIs	https://doi.org/10.1016/j.rinp.2025.108187
Publication status	Published - Apr 2025

Keywords

Near-field Optical Field
Photochemical Etching
Quartz
Roughness

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10.1016/j.rinp.2025.108187

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title = "Nano polishing of a rough quartz surface: Numerical calculation of surface evolution",

abstract = "A numerical 3D model of nano-local photochemical etching for polishing a rough quartz surface has been developed. This surface is illuminated from the quartz side at the critical angle of total internal reflection. The light source is a laser coherent monochromatic radiation with linear polarization, and the electric field strength vector lies in the plane of light incidence. The model uses a numerical solution of the Helmholtz equation using the finite elements method. The proposed model allows to describe the evolution of etching of a rough surface and obtain a subnano-meter level of surface roughness. The results of calculation show that the use of two independent sources of linearly polarized laser radiation provides the required level of surface roughness and increases the efficiency of the model compared to direct illumination.",

keywords = "Near-field Optical Field, Photochemical Etching, Quartz, Roughness",

author = "Vasyl Kanevskii and Serhii Kolienov and Valerii Grygoruk and Ivan Voiteshenko and Oleksandr Stelmakh and Yue Wu and Hao Zhang",

note = "Publisher Copyright: {\textcopyright} 2025 The Authors",

year = "2025",

month = apr,

doi = "10.1016/j.rinp.2025.108187",

language = "English",

volume = "71",

journal = "Results in Physics",

issn = "2211-3797",

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TY - JOUR

T1 - Nano polishing of a rough quartz surface

T2 - Numerical calculation of surface evolution

AU - Kanevskii, Vasyl

AU - Kolienov, Serhii

AU - Grygoruk, Valerii

AU - Voiteshenko, Ivan

AU - Stelmakh, Oleksandr

AU - Wu, Yue

AU - Zhang, Hao

PY - 2025/4

Y1 - 2025/4

N2 - A numerical 3D model of nano-local photochemical etching for polishing a rough quartz surface has been developed. This surface is illuminated from the quartz side at the critical angle of total internal reflection. The light source is a laser coherent monochromatic radiation with linear polarization, and the electric field strength vector lies in the plane of light incidence. The model uses a numerical solution of the Helmholtz equation using the finite elements method. The proposed model allows to describe the evolution of etching of a rough surface and obtain a subnano-meter level of surface roughness. The results of calculation show that the use of two independent sources of linearly polarized laser radiation provides the required level of surface roughness and increases the efficiency of the model compared to direct illumination.

AB - A numerical 3D model of nano-local photochemical etching for polishing a rough quartz surface has been developed. This surface is illuminated from the quartz side at the critical angle of total internal reflection. The light source is a laser coherent monochromatic radiation with linear polarization, and the electric field strength vector lies in the plane of light incidence. The model uses a numerical solution of the Helmholtz equation using the finite elements method. The proposed model allows to describe the evolution of etching of a rough surface and obtain a subnano-meter level of surface roughness. The results of calculation show that the use of two independent sources of linearly polarized laser radiation provides the required level of surface roughness and increases the efficiency of the model compared to direct illumination.

KW - Near-field Optical Field

KW - Photochemical Etching

KW - Quartz

KW - Roughness

UR - https://www.scopus.com/pages/publications/86000165720

U2 - 10.1016/j.rinp.2025.108187

DO - 10.1016/j.rinp.2025.108187

M3 - Article

AN - SCOPUS:86000165720

SN - 2211-3797

VL - 71

JO - Results in Physics

JF - Results in Physics

M1 - 108187

ER -

Nano polishing of a rough quartz surface: Numerical calculation of surface evolution

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Keywords

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