Multilayer Nitride-based Memristors with Alscn Interlayer for Memory and Neuromorphic Computing Applications

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

Nitride-based memristors are known for remarkable properties, including high on/off ratio, rapid switching speed, and seamless compatibility with CMOS processes. In this study, we introduce a multilayer nitride-based memristor with a stacked composition of AIN/AIScN/AIN, showcasing enhanced bipolar resistive switching characteristics. This novel design features AIScN as an interlayer within the AIN matrix, establishing a triple-stacked structure. The built-in electric field, generated by the ferroelectric polarization of the AlScN layer, effectively hinders the migration of electrons and ions within the AIN layer. Such memristors will exhibit promising potential applications in next-generation non-volatile memory and neuromorphic computing technologies.

Original languageEnglish
Title of host publicationProceedings of the 16th IEEE International Conference on Electron Devices and Solid-State Circuits, EDSSC 2025
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages157-158
Number of pages2
ISBN (Electronic)9798331522087
DOIs
Publication statusPublished - 2025
Event16th IEEE International Conference on Electron Devices and Solid-State Circuits, EDSSC 2025 - Yinchuan, China
Duration: 13 Jun 202515 Jun 2025

Publication series

NameProceedings of the 16th IEEE International Conference on Electron Devices and Solid-State Circuits, EDSSC 2025

Conference

Conference16th IEEE International Conference on Electron Devices and Solid-State Circuits, EDSSC 2025
Country/TerritoryChina
CityYinchuan
Period13/06/2515/06/25

Keywords

  • AlScN
  • Memristor
  • Multilayer
  • Nitride

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