Moisture barrier evaluation of SiOx/SiNx stacks on polyimide substrates using electrical calcium test

Shiyu Zhang; Wei Xue; Zhinong Yu

doi:10.1016/j.tsf.2015.02.023

Moisture barrier evaluation of SiO_x/SiN_x stacks on polyimide substrates using electrical calcium test

Shiyu Zhang, Wei Xue, Zhinong Yu^*

^*Corresponding author for this work

School of Optics and Photonics, Beijing Institute of Technology

Research output: Contribution to journal › Article › peer-review

43 Citations (Scopus)

Abstract

Electrical calcium (Ca) test was used to measure water vapor transmission rate (WVTR) through polyimide (PI) substrate with barrier films. The WVTR was obtained by measuring the resistance of the Ca as a function of time. Barrier films consisted of silicon oxide (SiO_x)/silicon nitride (SiN_x) stacks were consecutively deposited onto the PI substrate at 350 °C by plasma-enhanced chemical vapor deposition. SiN_x and SiO_x films show great moisture impermeability while the SiN_x film presented higher moisture resistance than the SiO_x film. The sample of PI coated with SiO_x/SiN_x stacks was kept flat by stress compensation of SiN_x film and SiO_x film. The WVTR value of the optimum barrier structure (5 pairs of SiO_x/SiN_x) is 5.58 × 10^{- 6} g/(m² day) under an electrical Ca test (25 °C, 40% relative humidity). After 500 times cyclic bending in a compressive mode, WVTR value keeps below 4.32 × 10^{- 5} g/(m² day). The SiO_x/SiN_x barrier stacks presented on PI have a great potential for flexible electronics applications.

Original language	English
Pages (from-to)	101-105
Number of pages	5
Journal	Thin Solid Films
Volume	580
DOIs	https://doi.org/10.1016/j.tsf.2015.02.023
Publication status	Published - 1 Apr 2015
Externally published	Yes

Keywords

Plasma-enhanced chemical vapor deposition
Polyimide
Silicon nitride
Silicon oxide
Water vapor transmission rate

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title = "Moisture barrier evaluation of SiOx/SiNx stacks on polyimide substrates using electrical calcium test",

abstract = "Electrical calcium (Ca) test was used to measure water vapor transmission rate (WVTR) through polyimide (PI) substrate with barrier films. The WVTR was obtained by measuring the resistance of the Ca as a function of time. Barrier films consisted of silicon oxide (SiOx)/silicon nitride (SiNx) stacks were consecutively deposited onto the PI substrate at 350 °C by plasma-enhanced chemical vapor deposition. SiNx and SiOx films show great moisture impermeability while the SiNx film presented higher moisture resistance than the SiOx film. The sample of PI coated with SiOx/SiNx stacks was kept flat by stress compensation of SiNx film and SiOx film. The WVTR value of the optimum barrier structure (5 pairs of SiOx/SiNx) is 5.58 × 10- 6 g/(m2 day) under an electrical Ca test (25 °C, 40% relative humidity). After 500 times cyclic bending in a compressive mode, WVTR value keeps below 4.32 × 10- 5 g/(m2 day). The SiOx/SiNx barrier stacks presented on PI have a great potential for flexible electronics applications.",

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author = "Shiyu Zhang and Wei Xue and Zhinong Yu",

year = "2015",

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doi = "10.1016/j.tsf.2015.02.023",

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AU - Zhang, Shiyu

AU - Xue, Wei

AU - Yu, Zhinong

PY - 2015/4/1

Y1 - 2015/4/1

N2 - Electrical calcium (Ca) test was used to measure water vapor transmission rate (WVTR) through polyimide (PI) substrate with barrier films. The WVTR was obtained by measuring the resistance of the Ca as a function of time. Barrier films consisted of silicon oxide (SiOx)/silicon nitride (SiNx) stacks were consecutively deposited onto the PI substrate at 350 °C by plasma-enhanced chemical vapor deposition. SiNx and SiOx films show great moisture impermeability while the SiNx film presented higher moisture resistance than the SiOx film. The sample of PI coated with SiOx/SiNx stacks was kept flat by stress compensation of SiNx film and SiOx film. The WVTR value of the optimum barrier structure (5 pairs of SiOx/SiNx) is 5.58 × 10- 6 g/(m2 day) under an electrical Ca test (25 °C, 40% relative humidity). After 500 times cyclic bending in a compressive mode, WVTR value keeps below 4.32 × 10- 5 g/(m2 day). The SiOx/SiNx barrier stacks presented on PI have a great potential for flexible electronics applications.

AB - Electrical calcium (Ca) test was used to measure water vapor transmission rate (WVTR) through polyimide (PI) substrate with barrier films. The WVTR was obtained by measuring the resistance of the Ca as a function of time. Barrier films consisted of silicon oxide (SiOx)/silicon nitride (SiNx) stacks were consecutively deposited onto the PI substrate at 350 °C by plasma-enhanced chemical vapor deposition. SiNx and SiOx films show great moisture impermeability while the SiNx film presented higher moisture resistance than the SiOx film. The sample of PI coated with SiOx/SiNx stacks was kept flat by stress compensation of SiNx film and SiOx film. The WVTR value of the optimum barrier structure (5 pairs of SiOx/SiNx) is 5.58 × 10- 6 g/(m2 day) under an electrical Ca test (25 °C, 40% relative humidity). After 500 times cyclic bending in a compressive mode, WVTR value keeps below 4.32 × 10- 5 g/(m2 day). The SiOx/SiNx barrier stacks presented on PI have a great potential for flexible electronics applications.

KW - Plasma-enhanced chemical vapor deposition

KW - Polyimide

KW - Silicon nitride

KW - Silicon oxide

KW - Water vapor transmission rate

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SP - 101

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JO - Thin Solid Films

JF - Thin Solid Films

ER -

Moisture barrier evaluation of SiO_x/SiN_x stacks on polyimide substrates using electrical calcium test

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Keywords

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